Inventor · disambiguated record
Melissa K. Rath
Also filed as: RATH MELISSA K
7 granted patents·2 pending applications·84 citations·filing 2004–2016
85Inventor score
Top patents by PatentIndex Score
9 records- 0193US8951948B2Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal compositionRATH MELISSA K·Filed 2006·Granted Feb 10, 2015·21 cites·15 claims
- 0292US8058219B2Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchantRATH MELISSA K·Filed 2006·Granted Nov 15, 2011·25 cites·20 claims
- 0390US7994108B2Composition useful for removal of post-etch photoresist and bottom anti-reflection coatingsADVANCED TECH MATERIALS·Filed 2006·Granted Aug 9, 2011·11 cites·18 claims
- 0487US9256134B2Photoresist removalADVANCED TECH MATERIALS·Filed 2014·Granted Feb 9, 2016·5 cites·16 claims
- 0582US8338087B2Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrateRATH MELISSA K·Filed 2004·Granted Dec 25, 2012·19 cites·41 claims
- 0680US8679734B2Photoresist removalMINSEK DAVID W·Filed 2012·Granted Mar 25, 2014·3 cites·20 claims
- 0765US9422513B2Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal compositionENTEGRIS INC·Filed 2014·Granted Aug 23, 2016·0 cites·14 claims
- 0857US2013109605A1Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrateADVANCED TECH MATERIALS·Filed 2012·Application pending·0 cites
- 0954US2016152926A1Photoresist removalADVANCED TECH MATERIALS·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →