Inventor · disambiguated record
Tetsuro Nakasugi
Also filed as: NAKASUGI TETSURO
50 granted patents·18 pending applications·551 citations·filing 1997–2024
98Inventor score
Top patents by PatentIndex Score
68 records- 0197US6897454B2Energy beam exposure method and exposure apparatusTOSHIBA KK·Filed 2003·Granted May 24, 2005·146 cites·21 claims
- 0294US9381540B2Pattern forming methodTOSHIBA KK·Filed 2015·Granted Jul 5, 2016·6 cites·19 claims
- 0392US8419995B2Imprint methodYONEDA IKUO·Filed 2009·Granted Apr 16, 2013·19 cites·13 claims
- 0491US12078925B2Imprint apparatus and imprint methodKIOXIA CORP·Filed 2022·Granted Sep 3, 2024·1 cites·18 claims
- 0589US8202463B2Imprint methodYONEDA IKUO·Filed 2009·Granted Jun 19, 2012·13 cites·14 claims
- 0687US8550801B2Imprint apparatus and methodFURUTONO YOHKO·Filed 2011·Granted Oct 8, 2013·11 cites·10 claims
- 0787US7435978B2System, method and a program for correcting conditions for controlling a charged particle beam for lithography and observation, and a program and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Oct 14, 2008·10 cites·20 claims
- 0887US6803589B2Apparatus and method applied to exposure by charged beamTOSHIBA KK·Filed 2001·Granted Oct 12, 2004·23 cites·15 claims
- 0986US6703629B2Charged beam exposure apparatus having blanking aperture and basic figure apertureTOSHIBA KK·Filed 2001·Granted Mar 9, 2004·18 cites·12 claims
- 1085US7242014B2Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted Jul 10, 2007·9 cites·16 claims
- 1185US6507034B1Charge beam exposure apparatus, charge beam exposure method, and charge beam exposure maskTOSHIBA KK·Filed 2000·Granted Jan 14, 2003·23 cites·21 claims
- 1285US5933211ACharged beam lithography apparatus and method thereofTOSHIBA KK·Filed 1997·Granted Aug 3, 1999·39 cites·11 claims
- 1384US5989759APattern forming method using alignment from latent image or base pattern on substrateTOSHIBA KK·Filed 1998·Granted Nov 23, 1999·41 cites·22 claims
- 1483US7202488B2Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted Apr 10, 2007·18 cites·20 claims
- 1582US9885118B2Template forming method, template, and template base materialTOSHIBA MEMORY CORP·Filed 2015·Granted Feb 6, 2018·2 cites·25 claims
- 1682US8227267B2Template inspection method and manufacturing method for semiconductor deviceYONEDA IKUO·Filed 2009·Granted Jul 24, 2012·7 cites·8 claims
- 1781US11004683B2Imprint apparatus, imprint method, and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2018·Granted May 11, 2021·2 cites·16 claims
- 1881US6737658B1Pattern observation apparatus and pattern observation methodTOSHIBA KK·Filed 2000·Granted May 18, 2004·17 cites·10 claims
- 1980US6512237B2Charged beam exposure method and charged beam exposure apparatusTOSHIBA KK·Filed 2002·Granted Jan 28, 2003·13 cites·3 claims
- 2079US7264909B2Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the sameTOSHIBA KK·Filed 2005·Granted Sep 4, 2007·4 cites·4 claims
- 2178US7045801B2Charged beam exposure apparatus having blanking aperture and basic figure apertureTOSHIBA KK·Filed 2005·Granted May 16, 2006·3 cites·5 claims
- 2277US10796948B2Pattern forming method and imprint apparatusTOSHIBA MEMORY CORP·Filed 2019·Granted Oct 6, 2020·1 cites·20 claims
- 2377US9046763B2Pattern forming methodKOSHIBA TAKESHI·Filed 2010·Granted Jun 2, 2015·3 cites·4 claims
- 2474US8973494B2Imprint method and imprint apparatusHATANO MASAYUKI·Filed 2011·Granted Mar 10, 2015·2 cites·20 claims
- 2574US8883373B2Method for manufacturing photo mask, method for manufacturing semiconductor device, and programMIMOTOGI AKIKO·Filed 2012·Granted Nov 11, 2014·2 cites·12 claims
- 2672US11953825B2Imprint apparatus, imprint method, and manufacturing method of semiconductor deviceKIOXIA CORP·Filed 2023·Granted Apr 9, 2024·0 cites·11 claims
- 2770US7283885B2Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writingTOSHIBA KK·Filed 2005·Granted Oct 16, 2007·2 cites·20 claims
- 2870US6941008B2Pattern forming methodTOSHIBA KK·Filed 2003·Granted Sep 6, 2005·7 cites·4 claims
- 2970US6147355APattern forming methodTOSHIBA KK·Filed 1999·Granted Nov 14, 2000·22 cites·8 claims
- 3070US6140654ACharged beam lithography apparatus and method thereofTOSHIBA KK·Filed 1999·Granted Oct 31, 2000·18 cites·5 claims
- 3169US8992789B2Method for manufacturing moldTOSHIBA KK·Filed 2013·Granted Mar 31, 2015·1 cites·16 claims
- 3269US7648809B2Electron beam exposure method, hot spot detecting apparatus, semiconductor device manufacturing method, and computer program productTOSHIBA KK·Filed 2006·Granted Jan 19, 2010·2 cites·16 claims
- 3369US7011915B2Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the sameTOSHIBA KK·Filed 2002·Granted Mar 14, 2006·6 cites·10 claims
- 3469US6818364B2Charged particle beam exposure apparatus and exposure methodTOSHIBA KK·Filed 2004·Granted Nov 16, 2004·6 cites·10 claims
- 3568US5994030APattern-forming method and lithographic systemTOSHIBA KK·Filed 1998·Granted Nov 30, 1999·23 cites·10 claims
- 3666US7368737B2Electron beam writing method, electron beam writing apparatus and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted May 6, 2008·2 cites·12 claims
- 3765US7985958B2Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing programTOSHIBA KK·Filed 2005·Granted Jul 26, 2011·1 cites·5 claims
- 3864US11837469B2Imprint apparatus, imprint method, and method of manufacturing semiconductor deviceKIOXIA CORP·Filed 2021·Granted Dec 5, 2023·0 cites·16 claims
- 3963US2020402843A1Pattern forming method and imprint apparatusKIOXIA CORP·Filed 2020·Application pending·0 cites
- 4062US2024427234A1Imprint method and method for manufacturing semiconductor deviceKIOXIA CORP·Filed 2024·Application pending·0 cites
- 4160US6762421B2Charged particle beam exposure apparatus and exposure methodTOSHIBA KK·Filed 2002·Granted Jul 13, 2004·6 cites·10 claims
- 4259US6914252B2Charged beam exposure apparatus having blanking aperture and basic figure apertureTOSHIBA KK·Filed 2004·Granted Jul 5, 2005·2 cites·5 claims
- 4359US2018119288A1Template and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 4457US2019079391A1Imprint apparatus and imprint methodTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
- 4556US2020073233A1Imprint apparatus, imprint method, and manufacturing method of semiconductor deviceTOSHIBA MEMORY CORP·Filed 2019·Application pending·0 cites
- 4655US6376136B1Charged beam exposure methodTOSHIBA KK·Filed 1999·Granted Apr 23, 2002·9 cites·13 claims
- 4753US9360752B2Pattern formation methodTOSHIBA KK·Filed 2013·Granted Jun 7, 2016·0 cites·13 claims
- 4853US2018151418A1Pattern forming method and imprint apparatusTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 4952US7482604B2Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor deviceTOSHIBA KK·Filed 2006·Granted Jan 27, 2009·0 cites·20 claims
- 5052US6093931APattern-forming method and lithographic systemTOSHIBA KK·Filed 1999·Granted Jul 25, 2000·11 cites·13 claims
Showing the top 50 of 68 patent records by PatentIndex Score.
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