Inventor · disambiguated record
Takeyuki Yamada
Also filed as: YAMADA TAKEYUKI
10 granted patents·4 pending applications·14 citations·filing 2005–2014
82Inventor score
Top patents by PatentIndex Score
14 records- 0187US8802334B2Surface treatment method for a mask blank, method of manufacturing a mask blank, and method of manufacturing a maskYAMADA TAKEYUKI·Filed 2012·Granted Aug 12, 2014·7 cites·18 claims
- 0266US9104112B2Mask blank, method of manufacturing the same, and transfer maskSAKAI KAZUYA·Filed 2011·Granted Aug 11, 2015·1 cites·14 claims
- 0365US8748062B2Method of cleaning substrateYAMAUCHI KAZUTO·Filed 2012·Granted Jun 10, 2014·1 cites·7 claims
- 0462US8114556B2Photomask blank and production method thereof, and photomask production method, and semiconductor device production methodYAMADA TAKEYUKI·Filed 2006·Granted Feb 14, 2012·1 cites·32 claims
- 0562US7901842B2Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor deviceHOYA CORP·Filed 2006·Granted Mar 8, 2011·1 cites·25 claims
- 0662US7804648B2Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective maskHOYA CORP·Filed 2006·Granted Sep 28, 2010·3 cites·14 claims
- 0753US8697315B2Photomask blank and production method thereof, and photomask production method, and semiconductor device production methodYAMADA TAKEYUKI·Filed 2012·Granted Apr 15, 2014·0 cites·20 claims
- 0853US2014230848A1Method of cleaning substrateUNIV OSAKA·Filed 2014·Application pending·0 cites
- 0946US10481488B2Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication methodHOYA CORP·Filed 2013·Granted Nov 19, 2019·0 cites·19 claims
- 1045US10310373B2Method for manufacturing mask blank substrate, method for manufacturing mask blank and method for manufacturing transfer maskHOYA CORP·Filed 2014·Granted Jun 4, 2019·0 cites·20 claims
- 1142US2015079502A1Mask blank and method of manufacturing a transfer maskHOYA CORP·Filed 2013·Application pending·0 cites
- 1242US2015111134A1Mask blank and method of manufacturing a transfer maskHOYA CORP·Filed 2013·Application pending·0 cites
- 1340US2008305406A1Photomask Blank, Photomask Manufacturing Method and Semiconductor Device Manufacturing MethodHOYA CORP·Filed 2005·Application pending·0 cites
- 1439US8081384B2Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective maskHOSOYA MORIO·Filed 2006·Granted Dec 20, 2011·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →