Method of cleaning substrate

Abstract

The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or cleaning particles from a injection nozzle to at least one surface of the substrate.

1 . A method of cleaning a substrate, comprising cleaning at least one surface of the substrate by injecting pressurized cleaning liquid from a injection nozzle to the at least one surface of the substrate, wherein
 the cleaning liquid containing bubbles or cleaning particles is supplied to the nozzle with pressurized state,   the substrate and the nozzle are located in a liquid, and   the pressurized cleaning liquid is injected from the injection nozzle to the liquid, so that the at least one surface of the substrate is cleaned by the pressurized cleaning liquid that is injected to the liquid.   
     
     
         2 . The method of cleaning the substrate according to  claim 1 , wherein the cleaning liquid is pure water. 
     
     
         3 . The method of cleaning the substrate according to  claim 1 , wherein the cleaning liquid further contains a surfactant. 
     
     
         4 . The method of cleaning the substrate according to  claim 2 , wherein the cleaning liquid further contains an acidic substance or an alkaline substance. 
     
     
         5 . The method of cleaning the substrate according to  claim 1 , wherein the injection nozzle has an opening with a shape of a slit or a pinhole. 
     
     
         6 . The method of cleaning the substrate according to  claim 1 , wherein the cleaning particles is latex particles. 
     
     
         7 . The method of cleaning the substrate according to  claim 1 , wherein the substrate comprises a glass material. 
     
     
         8 . The method of cleaning the substrate according to  claim 1 , wherein the substrate comprises a synthetic quartz glass or a low thermal expansion glass.