Inventor · disambiguated record
Kazufumi Azuma
Also filed as: AZUMA KAZUFUMI
15 granted patents·13 pending applications·693 citations·filing 1983–2011
93Inventor score
Top patents by PatentIndex Score
28 records- 0198US7307028B2Film-forming method, method of manufacturing semiconductor device, semiconductor device, method of manufacturing display device, and display deviceADV LCD TECH DEV CT CO LTD·Filed 2004·Granted Dec 11, 2007·469 cites·7 claims
- 0295US4495218AProcess for forming thin filmHITACHI LTD·Filed 1983·Granted Jan 22, 1985·121 cites·8 claims
- 0388US4604294AProcess for forming an organic thin filmHITACHI LTD·Filed 1984·Granted Aug 5, 1986·23 cites·23 claims
- 0486US7728251B2Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacingSHARP KK·Filed 2005·Granted Jun 1, 2010·10 cites·9 claims
- 0583US8136479B2Plasma treatment apparatus and plasma treatment methodSUGAI HIDEO·Filed 2005·Granted Mar 20, 2012·11 cites·11 claims
- 0679US6692848B2Magnetic disk apparatusHITACHI LTD·Filed 2001·Granted Feb 17, 2004·16 cites·7 claims
- 0778US7311796B2Plasma processing apparatusEKISHO SENTAN GIJUTSU KAIHATSU·Filed 2003·Granted Dec 25, 2007·21 cites·8 claims
- 0876US7830606B2Optical device and crystallization deviceADV LCD TECH DEV CT CO LTD·Filed 2009·Granted Nov 9, 2010·6 cites·3 claims
- 0967US7998841B2Method for dehydrogenation treatment and method for forming crystalline silicon filmADV LCD TECH DEV CT CO LTD·Filed 2009·Granted Aug 16, 2011·3 cites·17 claims
- 1066US7897946B2Crystallization apparatus, crystallization method, device, and light modulation elementADV LCD TECH DEV CT CO LTD·Filed 2008·Granted Mar 1, 2011·1 cites·15 claims
- 1163US7446060B2Thin-film forming method using silane and an oxidizing gasADV LCD TECH DEV CT CO LTD·Filed 2007·Granted Nov 4, 2008·1 cites·2 claims
- 1262US7612943B2Optical device and crystallization deviceADV LCD TECH DEV CT CO LTD·Filed 2007·Granted Nov 3, 2009·2 cites·5 claims
- 1357US2010239782A1Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatusADV LCD TECH DEV CT CO LTD·Filed 2010·Application pending·0 cites
- 1454US2005205015A1Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatusSASAKI ATSUSHI·Filed 2005·Application pending·0 cites
- 1553US8009345B2Crystallization apparatus, crystallization method, device, and light modulation elementADV LCD TECH DEV CT CO LTD·Filed 2010·Granted Aug 30, 2011·0 cites·3 claims
- 1651US2009029507A1Dielectric film, its formation method, semiconductor device using the dielectric film and its production methodEKISHO SENTAN KK·Filed 2007·Application pending·0 cites
- 1749US4530746APhotosensitive resin compositionHITACHI LTD·Filed 1983·Granted Jul 23, 1985·9 cites·15 claims
- 1848US2007034157A1Plasma processing apparatus and plasma processing methodNAKATA YUKIHIKO·Filed 2006·Application pending·0 cites
- 1948US2004107910A1Plasma processing apparatus and plasma processing methodFiled 2003·Application pending·0 cites
- 2047US7727913B2Method of crystallizing semiconductor filmADV LCD TECH DEV CT CO LTD·Filed 2008·Granted Jun 1, 2010·0 cites·12 claims
- 2147US2009278060A1Photoirradiation apparatus, crystallization apparatus, crystallization method, and deviceTANIGUCHI YUKIO·Filed 2009·Application pending·0 cites
- 2246US2009134394A1Crystal silicon array, and manufacturing method of thin film transistorAZUMA KAZUFUMI·Filed 2008·Application pending·0 cites
- 2346US2008105650A1Plasma processing device and plasma processing methodSUGAI HIDEO·Filed 2008·Application pending·0 cites
- 2446US2011262679A1Gas barrier film and organnic device using the sameSHIMADZU CORP·Filed 2011·Application pending·0 cites
- 2543US2008099447A1Plasma processing apparatus and plasma processing methodANDO MAKOTO·Filed 2006·Application pending·0 cites
- 2641US2004113227A1Dielectric film, its formation method, semiconductor device using the dielectric film and its production methodGOTO MASASHI·Filed 2003·Application pending·0 cites
- 2738US2004069612A1Substrate processing apparatus and substrate processing methodFiled 2003·Application pending·0 cites
- 2837US2003168004A1Manufacturing apparatus of an insulation filmFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →