Inventor · disambiguated record
Michael Haverty
Also filed as: HAVERTY MICHAEL · HAVERTY MICHAEL G
16 granted patents·27 pending applications·15 citations·filing 2004–2025
87Inventor score
Files withAPPLIED MATERIALS INC22HAVERTY MICHAEL G6INTEL CORP4HAVERTY MICHAEL2APPLIED MATERLALS INC1
Top patents by PatentIndex Score
43 records- 0185US11658025B2Chalcogen precursors for deposition of silicon nitrideAPPLIED MATERIALS INC·Filed 2021·Granted May 23, 2023·2 cites·12 claims
- 0283US10483385B2Nanowire structures having wrap-around contactsCEA STEPHEN M·Filed 2011·Granted Nov 19, 2019·4 cites·24 claims
- 0379US8779589B2Liner layers for metal interconnectsSIMKA HARSONO S·Filed 2010·Granted Jul 15, 2014·8 cites·21 claims
- 0475US10840366B2Nanowire structures having wrap-around contactsINTEL CORP·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 0574US12281382B2Methods for depositing blocking layers on conductive surfacesAPPLIED MATERIALS INC·Filed 2023·Granted Apr 22, 2025·0 cites·5 claims
- 0670US12142477B2Chalcogen precursors for deposition of silicon nitrideAPPLIED MATERIALS INC·Filed 2023·Granted Nov 12, 2024·0 cites·17 claims
- 0767US11757026B2Nanowire structures having wrap-around contactsGOOGLE LLC·Filed 2020·Granted Sep 12, 2023·0 cites·20 claims
- 0867US11702733B2Methods for depositing blocking layers on conductive surfacesAPPLIED MATERIALS INC·Filed 2021·Granted Jul 18, 2023·0 cites·13 claims
- 0960US12500080B2Systems and methods for depositing low-K dielectric filmsAPPLIED MATERIALS INC·Filed 2022·Granted Dec 16, 2025·0 cites·20 claims
- 1060US11821070B2Ruthenium film deposition using low valent metal precursorsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 21, 2023·0 cites·16 claims
- 1158US2025270693A1Enabling thick mosi growthAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1258US2025125157A1Optimum material stacks for semiconductor contactsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1357US11626288B2Integrated contact silicide with tunable work functionsAPPLIED MATERIALS INC·Filed 2021·Granted Apr 11, 2023·0 cites·20 claims
- 1457US2024355675A1Methods of forming interconnect structuresAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1555US2024363337A1Methods for forming low-k dielectric materialsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1655US2024071927A1Tantalum doped ruthenium layers for interconnectsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1754US9577057B2Semiconductor device contactsINTEL CORP·Filed 2015·Granted Feb 21, 2017·0 cites·16 claims
- 1853US2025046600A1Titanium nitride gapfill processes for semiconductor devicesAPPLIED MATERLALS INC·Filed 2023·Application pending·0 cites
- 1953US2025313950A1Precursor, gas mixture, and method for depositing a low k dielectric filmAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2053US2025299944A1Electron-withdrawing functional groups on si-chalcogen precursorsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2152US2023268415A1Conductive oxide silicides for reliable low contact resistanceAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2252US2023317516A1Metal Surface Blocking Molecules for Selective DepositionAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2352US2017162661A1Semiconductor device contactsINTEL CORP·Filed 2017·Application pending·0 cites
- 2452US2023268414A1Silicides, alloys and intermetallics to minimize resistanceAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2550US12141688B2Crested barrier device and synaptic elementAPPLIED MATERIALS INC·Filed 2021·Granted Nov 12, 2024·0 cites·20 claims
- 2650US2024087881A1Systems and methods for depositing low-k dielectric filmsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2749US2023268399A1Low contact resistance unsilicides for semiconductor applicationsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2849US2023070489A1Doped tantalum-containing barrier filmsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2948US8154121B2Polymer interlayer dielectric and passivation materials for a microelectronic deviceSHAH KUNAL·Filed 2008·Granted Apr 10, 2012·0 cites·20 claims
- 3048US2020149158A1Low temperature ald of metal oxidesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 3147US9166004B2Semiconductor device contactsHAVERTY MICHAEL G·Filed 2010·Granted Oct 20, 2015·0 cites·15 claims
- 3244US2009166867A1Metal interconnect structures for semiconductor devicesSIMKA HARSONO·Filed 2007·Application pending·0 cites
- 3342US2009001591A1Reducing resistivity in metal interconnects by compressive strainingHAVERTY MICHAEL·Filed 2007·Application pending·0 cites
- 3442US2009004463A1Reducing resistivity in metal interconnects using interface controlHAVERTY MICHAEL·Filed 2007·Application pending·0 cites
- 3541US2007224834A1Dielectric material having carborane derivativesHAVERTY MICHAEL G·Filed 2006·Application pending·0 cites
- 3640US2006220251A1Reducing internal film stress in dielectric filmKLOSTER GRANT·Filed 2005·Application pending·0 cites
- 3740US2015187900A1Composite materials for use in semiconductor componentsSHANKAR SADASIVAN·Filed 2013·Application pending·0 cites
- 3839US2006068190A1Electronic devices with molecular sieve layersINTEL CORP·Filed 2004·Application pending·0 cites
- 3939US2005287787A1Porous ceramic materials as low-k films in semiconductor devicesKLOSTER GRANT M·Filed 2004·Application pending·0 cites
- 4036US2007123059A1Methods of internal stress reduction in dielectric films with chemical incorporation and structures formed therebyHAVERTY MICHAEL G·Filed 2005·Application pending·0 cites
- 4135US2007269646A1Bond termination of pores in a porous diamond dielectric materialHAVERTY MICHAEL G·Filed 2006·Application pending·0 cites
- 4235US2006071300A1Dielectric material having carborane derivativesHAVERTY MICHAEL G·Filed 2004·Application pending·0 cites
- 4334US8633534B2Transistor channel mobility using alternate gate dielectric materialsHAVERTY MICHAEL G·Filed 2010·Granted Jan 21, 2014·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →