Inventor · disambiguated record
Niraj Rana
Also filed as: RANA NIRAJ · RANA NIRAJ B
33 granted patents·4 pending applications·174 citations·filing 2004–2023
96Inventor score
Top patents by PatentIndex Score
37 records- 0197US7557013B2Methods of forming a plurality of capacitorsMICRON TECHNOLOGY INC·Filed 2006·Granted Jul 7, 2009·70 cites·45 claims
- 0295US8129205B2Solid state lighting devices and associated methods of manufacturingRANA NIRAJ·Filed 2010·Granted Mar 6, 2012·34 cites·16 claims
- 0389US7902081B2Methods of etching polysilicon and methods of forming pluralities of capacitorsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 8, 2011·15 cites·51 claims
- 0481US7683021B2Methods of removing metal-containing materialsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 23, 2010·4 cites·18 claims
- 0579US9159780B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2015·Granted Oct 13, 2015·2 cites·19 claims
- 0678US10903070B2Asymmetric wafer bow compensation by chemical vapor depositionLAM RES CORP·Filed 2018·Granted Jan 26, 2021·2 cites·19 claims
- 0778US8216911B2Methods for etching doped oxides in the manufacture of microfeature devicesRANA NIRAJ·Filed 2010·Granted Jul 10, 2012·3 cites·19 claims
- 0875US7824505B2Method to address carbon incorporation in an interpoly oxideMICRON TECHNOLOGY INC·Filed 2006·Granted Nov 2, 2010·4 cites·17 claims
- 0974US7892937B2Methods of forming capacitorsMICRON TECHNOLOGY INC·Filed 2008·Granted Feb 22, 2011·3 cites·27 claims
- 1074US7297639B2Methods for etching doped oxides in the manufacture of microfeature devicesMICRON TECHNOLOGY INC·Filed 2005·Granted Nov 20, 2007·3 cites·44 claims
- 1173US7683020B2Methods of removing metal-containing materialsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 23, 2010·2 cites·11 claims
- 1272US8802525B2Methods of forming charge storage structures including etching diffused regions to form recessesSCHRINSKY ALEX·Filed 2011·Granted Aug 12, 2014·3 cites·24 claims
- 1369US7244682B2Methods of removing metal-containing materialsMICRON TECHNOLOGY INC·Filed 2004·Granted Jul 17, 2007·7 cites·16 claims
- 1468US8546016B2Solutions for cleaning semiconductor structures and related methodsSAPRA SANJEEV·Filed 2011·Granted Oct 1, 2013·2 cites·22 claims
- 1566US8709846B2Solid state lighting devices and associated methods of manufacturingMICRON TECHNOLOGY INC·Filed 2013·Granted Apr 29, 2014·1 cites·20 claims
- 1665US8946043B2Methods of forming capacitorsGREELEY JOSEPH NEIL·Filed 2011·Granted Feb 3, 2015·1 cites·13 claims
- 1765US8476640B2Solid state lighting devices and associated methods of manufacturingRANA NIRAJ·Filed 2012·Granted Jul 2, 2013·1 cites·15 claims
- 1864US7541635B2Semiconductor fabrication using a collarMICRON TECHNOLOGY INC·Filed 2006·Granted Jun 2, 2009·2 cites·19 claims
- 1963US8512587B2Highly selective doped oxide etchantRANA NIRAJ·Filed 2007·Granted Aug 20, 2013·1 cites·36 claims
- 2063US7806988B2Method to address carbon incorporation in an interpoly oxideMICRON TECHNOLOGY INC·Filed 2004·Granted Oct 5, 2010·7 cites·28 claims
- 2159US7109089B2Semiconductor fabrication using a collarMICRON TECHNOLOGY INC·Filed 2004·Granted Sep 19, 2006·7 cites·51 claims
- 2256US9087737B2Methods of forming charge storage structures including etching diffused regions to form recessesMICRON TECHNOLOGY INC·Filed 2014·Granted Jul 21, 2015·0 cites·19 claims
- 2355US7803686B2Methods for etching doped oxides in the manufacture of microfeature devicesMICRON TECHNOLOGY INC·Filed 2007·Granted Sep 28, 2010·0 cites·12 claims
- 2455US7683022B2Methods of removing metal-containing materialsMICRON TECHNOLOGY INC·Filed 2006·Granted Mar 23, 2010·0 cites·9 claims
- 2555US7368416B2Methods of removing metal-containing materialsMICRON TECHNOLOGY INC·Filed 2006·Granted May 6, 2008·0 cites·15 claims
- 2654US8513086B2Methods for etching doped oxides in the manufacture of microfeature devicesRANA NIRAJ·Filed 2012·Granted Aug 20, 2013·0 cites·23 claims
- 2754US7642196B2Semiconductor fabrication processesMICRON TECHNOLOGY INC·Filed 2006·Granted Jan 5, 2010·0 cites·25 claims
- 2853US8969217B2Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substratesMICRON TECHNOLOGY INC·Filed 2013·Granted Mar 3, 2015·0 cites·16 claims
- 2953US8492288B2Methods of treating semiconductor substrates, methods of forming openings during semiconductor fabrication, and methods of removing particles from over semiconductor substratesFUCSKO JANOS·Filed 2008·Granted Jul 23, 2013·0 cites·25 claims
- 3053US2025308885A1Hydrogen reduction in amorphous carbon filmsLAM RES CORP·Filed 2023·Application pending·0 cites
- 3152US8026148B2Methods of utilizing silicon dioxide-containing masking structuresMICRON TECHNOLOGY INC·Filed 2011·Granted Sep 27, 2011·0 cites·13 claims
- 3250US7713885B2Methods of etching oxide, reducing roughness, and forming capacitor constructionsMICRON TECHNOLOGY INC·Filed 2005·Granted May 11, 2010·0 cites·13 claims
- 3350US2016013263A1Methods of Forming CapacitorsMICRON TECHNOLOGY INC·Filed 2015·Application pending·0 cites
- 3449US2007207622A1Highly selective doped oxide etchantMICRON TECHNOLOGY INC·Filed 2006·Application pending·0 cites
- 3548US12340992B2Detection and location of anomalous plasma events in fabrication chambersLAM RES CORP·Filed 2020·Granted Jun 24, 2025·0 cites·25 claims
- 3648US2023369091A1High temperature pedestal with extended electrostatic chuck electrodeLAM RES CORP·Filed 2021·Application pending·0 cites
- 3741US8124545B2Methods of etching oxide, reducing roughness, and forming capacitor constructionsRANA NIRAJ B·Filed 2010·Granted Feb 28, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →