Inventor · disambiguated record
Ichiro Katakabe
Also filed as: KATAKABE ICHIRO
12 granted patents·10 pending applications·623 citations·filing 1994–2009
93Inventor score
Top patents by PatentIndex Score
22 records- 0196US5643046APolishing method and apparatus for detecting a polishing end point of a semiconductor waferTOSHIBA KK·Filed 1995·Granted Jul 1, 1997·207 cites·9 claims
- 0291US6921466B2Revolution member supporting apparatus and semiconductor substrate processing apparatusEBARA CORP·Filed 2001·Granted Jul 26, 2005·48 cites·3 claims
- 0391US6558478B1Method of and apparatus for cleaning substrateEBARA CORP·Filed 2000·Granted May 6, 2003·65 cites·30 claims
- 0491US5605488APolishing apparatus of semiconductor waferTOSHIBA KK·Filed 1994·Granted Feb 25, 1997·192 cites·12 claims
- 0569US7578886B2Substrate processing apparatus, substrate processing method, and substrate holding apparatusEBARA CORP·Filed 2004·Granted Aug 25, 2009·14 cites·35 claims
- 0668US6745784B2Method of and apparatus for cleaning substrateEBARA CORP·Filed 2003·Granted Jun 8, 2004·11 cites·28 claims
- 0764US5943578AMethod of manufacturing a semiconductor device having an element isolating regionTOSHIBA KK·Filed 1997·Granted Aug 24, 1999·25 cites·15 claims
- 0863US5880032AMethod and apparatus for manufacturing a semiconductor deviceTOSHIBA KK·Filed 1996·Granted Mar 9, 1999·28 cites·15 claims
- 0957US2009026068A1Revolution member supporting apparatus and semiconductor substrate processing apparatusHONGO AKIHISA·Filed 2008·Application pending·0 cites
- 1056US5878191AHeat treatment apparatus for semiconductor wafersTOSHIBA KK·Filed 1995·Granted Mar 2, 1999·22 cites·62 claims
- 1154US2007113977A1Revolution member supporting apparatus and semiconductor substrate processing apparatusHONGO AKIHISA·Filed 2007·Application pending·0 cites
- 1252US6776919B2Method and apparatus for etching ruthenium filmsEBARA CORP·Filed 2001·Granted Aug 17, 2004·4 cites·11 claims
- 1349US7309449B2Substrate processing methodEBARA CORP·Filed 2004·Granted Dec 18, 2007·4 cites·16 claims
- 1448US7578887B2Apparatus for and method of processing substrateEBARA CORP·Filed 2004·Granted Aug 25, 2009·3 cites·1 claims
- 1548US2008017220A1Apparatus for cleaning a substrate having metal interconnectsKODERA MASAKO·Filed 2007·Application pending·0 cites
- 1646US2010043839A1Substrate processing methodHAMADA SATOMI·Filed 2009·Application pending·0 cites
- 1744US2005087441A1Revolution member supporting apparatus and semiconductor substrate processing apparatusFiled 2004·Application pending·0 cites
- 1840US2004177655A1Apparatus for cleaning a substrate having metal interconnectsFiled 2004·Application pending·0 cites
- 1938US2004245214A1Electroless plating apparatus and post-electroless plating cleaning methodFiled 2003·Application pending·0 cites
- 2038US2005026455A1Substrate processing apparatus and substrate processing methodFiled 2004·Application pending·0 cites
- 2138US2008110861A1Substrate Processing Apparatus and MethodKAJITA SHINJI·Filed 2005·Application pending·0 cites
- 2234US2003092264A1Substrate processing apparatus and methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →