Inventor · disambiguated record
Marcus Schumacher
Also filed as: SCHUMACHER MARCUS
4 granted patents·6 pending applications·411 citations·filing 2002–2013
76Inventor score
Top patents by PatentIndex Score
10 records- 0195US6849241B2Device and method for depositing one or more layers on a substrateAIXTRON AG·Filed 2002·Granted Feb 1, 2005·401 cites·20 claims
- 0278US7410670B2Process and apparatus for depositing single-component or multi-component layers and layer sequences using discontinuous injection of liquid and dissolved starting substances via a multi-channel injection unitAIXTRON AG·Filed 2006·Granted Aug 12, 2008·4 cites·19 claims
- 0361US8906456B2Apparatus and method for high-throughput chemical vapor depositionAIXTRON INC·Filed 2013·Granted Dec 9, 2014·0 cites·10 claims
- 0456US7732308B2Process for depositing layers containing silicon and germaniumAIXTRON INC·Filed 2005·Granted Jun 8, 2010·6 cites·29 claims
- 0549US2008096369A1Apparatus and method for high-throughput chemical vapor depositionSTRZYZEWSKI PIOTR·Filed 2005·Application pending·0 cites
- 0645US2008274278A1Method for Depositing in Particular Metal Oxides by Means of Discontinuous Precursor InjectionBAUMANN PETER·Filed 2005·Application pending·0 cites
- 0741US2005092246A1Device for depositing thin layers with a wireless detection of process parametersFiled 2004·Application pending·0 cites
- 0839US2007009659A1Process for the self-limiting deposition of one or more monolayersBAUMANN PETER·Filed 2006·Application pending·0 cites
- 0939US2004013800A1Device and method for feeding a liquid starting material, which has been brought into the gaseous state, into a CVD reactorFiled 2003·Application pending·0 cites
- 1037US2003056728A1Method and device for depositing at least one precursor, which is in liquid or dissolved form, on at least one substrateFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →