Inventor · disambiguated record
Yasuhiko Sugiyama
Also filed as: SUGIYAMA YASUHIKO
43 granted patents·8 pending applications·276 citations·filing 1994–2021
97Inventor score
Files withHITACHI HIGH TECH SCIENCE CORP23SEIKO INSTR INC12SII NANOTECHNOLOGY INC6HITACHI HIGH TECH CORP2KAITO TAKASHI2
Top patents by PatentIndex Score
51 records- 0186US9111717B2Ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2013·Granted Aug 18, 2015·7 cites·6 claims
- 0285US6870161B2Apparatus for processing and observing a sampleSII NANOTECHNOLOGY INC·Filed 2003·Granted Mar 22, 2005·23 cites·20 claims
- 0385US6838685B1Ion beam apparatus, ion beam processing method and sample holder memberSII NANOTECHNOLOGY INC·Filed 2003·Granted Jan 4, 2005·26 cites·17 claims
- 0482US8764994B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2013·Granted Jul 1, 2014·4 cites·4 claims
- 0581US8963100B2Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) paYASAKA ANTO·Filed 2012·Granted Feb 24, 2015·6 cites·18 claims
- 0680US9773634B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2017·Granted Sep 26, 2017·2 cites·11 claims
- 0776US8822911B2Focused ion beam apparatus and method of adjusting ion beam opticsHITACHI HIGH TECH SCIENCE CORP·Filed 2013·Granted Sep 2, 2014·3 cites·5 claims
- 0876US8274063B2Composite focused ion beam device, process observation method using the same, and processing methodKAITO TAKASHI·Filed 2008·Granted Sep 25, 2012·4 cites·20 claims
- 0975US9129771B2Emitter structure, gas ion source and focused ion beam systemHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Sep 8, 2015·2 cites·19 claims
- 1074US9378858B2Repair apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Jun 28, 2016·2 cites·5 claims
- 1173US6300628B1Focused ion beam machining method and device thereofSEIKO INSTR INC·Filed 1998·Granted Oct 9, 2001·23 cites·32 claims
- 1272US7172839B2Photomask correction method using composite charged particle beam, and device used in the correction methodSII NANOTECHNOLOGY INC·Filed 2003·Granted Feb 6, 2007·10 cites·6 claims
- 1371US10056232B2Charged particle beam apparatus and plasma ignition methodHITACHI HIGH TECH SCIENCE CORP·Filed 2017·Granted Aug 21, 2018·1 cites·6 claims
- 1471US9418817B2Focused ion beam apparatus and control method thereofHITACHI HIGH-TECH SCIENCE CORP·Filed 2014·Granted Aug 16, 2016·2 cites·17 claims
- 1571US8269194B2Composite focused ion beam device, and processing observation method and processing method using the sameKAITO TAKASHI·Filed 2008·Granted Sep 18, 2012·3 cites·19 claims
- 1671US5969355AFocused ion beam optical axis adjustment method and focused ion beam apparatusSEIKO INSTR INC·Filed 1997·Granted Oct 19, 1999·26 cites·24 claims
- 1770US6472881B1Liquid metal ion source and method for measuring flow impedance of liquid metal ion sourceSEIKO INSTR INC·Filed 2000·Granted Oct 29, 2002·9 cites·11 claims
- 1868US9336979B2Focused ion beam apparatus with precious metal emitter surfaceHITACHI HIGH TECH SCIENCE CORP·Filed 2015·Granted May 10, 2016·1 cites·12 claims
- 1968US7297944B2Ion beam device and ion beam processing method, and holder memberSII NANOTECHNOLOGY INC·Filed 2003·Granted Nov 20, 2007·9 cites·15 claims
- 2068US6437330B1Method and apparatus for adjusting a charged particle beam of a beam optical systemSEIKO INSTR INC·Filed 1999·Granted Aug 20, 2002·20 cites·7 claims
- 2168US6118122AIon beam working apparatusSEIKO INSTR INC·Filed 1997·Granted Sep 12, 2000·21 cites·11 claims
- 2266US7276691B2Ion beam device and ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2003·Granted Oct 2, 2007·6 cites·19 claims
- 2362US6489612B1Method of measuring film thicknessSEIKO INSTR INC·Filed 2000·Granted Dec 3, 2002·5 cites·24 claims
- 2459US9583299B2Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2014·Granted Feb 28, 2017·0 cites·1 claims
- 2559US8999178B2Method for fabricating emitterHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Apr 7, 2015·0 cites·4 claims
- 2658US11257655B2Focused ion beam apparatus, and control method for focused ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Granted Feb 22, 2022·0 cites·17 claims
- 2756US6177670B1Method of observing secondary ion image by focused ion beamSEIKO INSTR INC·Filed 1999·Granted Jan 23, 2001·18 cites·3 claims
- 2856US2002120508A1Point managing methodFiled 2002·Application pending·0 cites
- 2955US9640361B2Emitter structure, gas ion source and focused ion beam systemHITACHI HIGH-TECH SCIENCE CORP·Filed 2015·Granted May 2, 2017·0 cites·8 claims
- 3054US11017982B2Composite charged particle beam apparatus and control method thereofHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Granted May 25, 2021·0 cites·5 claims
- 3152US9793085B2Focused ion beam apparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Granted Oct 17, 2017·0 cites·11 claims
- 3252US2016322123A1Repair ApparatusHITACHI HIGH-TECH SCIENCE CORP·Filed 2016·Application pending·0 cites
- 3351US2007267579A1Photomask correction method using composite charged particle beam, and device used in the correction methodSUGIYAMA YASUHIKO·Filed 2006·Application pending·0 cites
- 3451US2008156998A1Focused Ion Beam ApparatusSUGIYAMA YASUHIKO·Filed 2007·Application pending·0 cites
- 3550US11721517B2Focused ion beam processing apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2021·Granted Aug 8, 2023·0 cites·8 claims
- 3650US11276555B2Charged particle beam apparatus, composite charged particle beam apparatus, and control method for charged particle beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2020·Granted Mar 15, 2022·0 cites·10 claims
- 3749US9245712B2Focused ion beam systemHITACHI HIGH TECH SCIENCE CORP·Filed 2014·Granted Jan 26, 2016·0 cites·5 claims
- 3849US5917186AFocused ion beam optical axis adjustment method and focused ion beam apparatusSEIKO INSTR INC·Filed 1997·Granted Jun 29, 1999·8 cites·14 claims
- 3949US2024355574A1Focused ion beam deviceHITACHI HIGH TECH SCIENCE CORP·Filed 2021·Application pending·0 cites
- 4049US2025285827A1Charged particle beam deviceHITACHI HIGH TECH SCIENCE CORP·Filed 2021·Application pending·0 cites
- 4148US9773637B2Plasma ion source and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Sep 26, 2017·0 cites·7 claims
- 4248US7576340B2Focused ion beam processing methodSII NANOTECHNOLOGY INC·Filed 2006·Granted Aug 18, 2009·0 cites·10 claims
- 4347US10176964B2Focused ion beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2016·Granted Jan 8, 2019·0 cites·19 claims
- 4447US6384418B1Sample transfer apparatus and sample stageSEIKO INSTR INC·Filed 1999·Granted May 7, 2002·12 cites·19 claims
- 4544US11017988B2Charged particle beam apparatusHITACHI HIGH TECH SCIENCE CORP·Filed 2019·Granted May 25, 2021·0 cites·8 claims
- 4644US9773646B2Plasma ion source and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Sep 26, 2017·0 cites·7 claims
- 4744US6281496B1Observing/forming method with focused ion beam and apparatus thereforSEIKO INSTR INC·Filed 1999·Granted Aug 28, 2001·10 cites·19 claims
- 4842US6331712B1Section formation observing methodSEIKO INSTR INC·Filed 1999·Granted Dec 18, 2001·9 cites·20 claims
- 4938US5438197AFocused ion beam apparatusSEIKO INSTR INC·Filed 1994·Granted Aug 1, 1995·4 cites·5 claims
- 5038US2003173527A1Focused ion beam system and machining method using itFiled 2002·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
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