Repair Apparatus

Abstract

There is provided a repair apparatus including a gas field ion source which includes an ion generation section including a sharpened tip, a cooling unit which cools the tip, an ion beam column which forms a focused ion beam by focusing ions of a gas generated in the gas field ion source, a sample stage which moves while a sample to be irradiated with the focused ion beam is placed thereon, a sample chamber which accommodates at least the sample stage therein, and a control unit which repairs a mask or a mold for nano-imprint lithography, which is the sample, with the focused ion beam formed by the ion beam column. The gas field ion source generates nitrogen ions as the ions, and the tip is constituted by an iridium single crystal capable of generating the ions.

1 - 5 . (canceled) 
     
     
         6 . A repair apparatus comprising:
 a gas field ion source which includes an ion generation section including a sharpened tip;   a cooling unit which is configured to cool the tip;   an ion beam column which is configured to form a focused ion beam by focusing ions of a gas generated in the gas field ion source;   a sample stage which is configured to move while a sample to be irradiated with the focused ion beam is placed thereon, the sample including a mask or a mold for nano-imprint lithography;   a sample chamber which is configured to accommodate at least the sample stage therein; and   a control unit which is configured to repair the sample with the focused ion beam formed by the ion beam column,   wherein the control unit is configured to change a type of the gas to be used for irradiating the sample with the focused ion beam in accordance with a type of the sample.   
     
     
         7 . The repair apparatus according to  claim 6 , wherein the control unit is configured to change the type of the gas to be used for irradiating the sample with the focused ion beam in accordance with a type of observation or processing to be performed on the sample. 
     
     
         8 . The repair apparatus according to  claim 6 , wherein the tip is configured by an iridium single crystal. 
     
     
         9 . The repair apparatus according to  claim 6 , wherein the control unit is configured to use a hydrogen ion beam as the focused ion beam for repairing the sample in a case where the sample is a mask for an Extreme Ultra Violet exposure. 
     
     
         10 . The repair apparatus according to  claim 6 , wherein the control unit is configured to use one of a helium ion beam, a neon ion beam, an argon ion beam, a krypton ion beam, and a xenon ion beam, as the focused ion beam for repairing the sample in a case where the sample is a photomask. 
     
     
         11 . The repair apparatus according to  claim 6 , wherein the control unit is configured to use a same type of the gas for sharpening the tip and for forming the focused ion beam. 
     
     
         12 . The repair apparatus according to  claim 11 , wherein the control unit is configured to use one of a hydrogen gas, a helium gas, and a nitrogen gas. 
     
     
         13 . A repair apparatus comprising:
 a gas field ion source which includes an ion generation section including a sharpened tip;   a cooling unit which is configured to cool the tip;   an ion beam column which is configured to form a focused ion beam by focusing ions of a gas generated in the gas field ion source;   a sample stage which is configured to move while a sample to be irradiated with the focused ion beam is placed thereon, the sample including a mask or a mold for nano-imprint lithography;   a sample chamber which is configured to accommodate at least the sample stage therein; and   a control unit which is configured to repair the sample with the focused ion beam formed by the ion beam column,   wherein the control unit is configured to use a hydrogen ion beam as the focused ion beam for repairing the sample in a case where the sample is a mask for an Extreme Ultra Violet exposure, and   wherein the control unit is configured to use one of a helium ion beam, a neon ion beam, an argon ion beam, a krypton ion beam, and a xenon ion beam, as the focused ion beam for repairing the sample in a case where the sample is a photomask.