Inventor · disambiguated record
Kien N. Chuc
Also filed as: CHUC KIEN · CHUC KIEN N · CHUC KIEN NAI
23 granted patents·7 pending applications·852 citations·filing 1990–2020
96Inventor score
Top patents by PatentIndex Score
30 records- 0199US9144147B2Semiconductor processing system and methods using capacitively coupled plasmaAPPLIED MATERIALS INC·Filed 2013·Granted Sep 22, 2015·188 cites·11 claims
- 0298US10354843B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2017·Granted Jul 16, 2019·40 cites·20 claims
- 0398US9978564B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·106 cites·13 claims
- 0498US9132436B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2013·Granted Sep 15, 2015·198 cites·19 claims
- 0596US8894767B2Flow control features of CVD chambersCHUC KIEN N·Filed 2010·Granted Nov 25, 2014·107 cites·16 claims
- 0696US8771538B2Plasma source designLUBOMIRSKY DMITRY·Filed 2010·Granted Jul 8, 2014·28 cites·5 claims
- 0794US10283321B2Semiconductor processing system and methods using capacitively coupled plasmaYANG JANG GYOO·Filed 2011·Granted May 7, 2019·39 cites·15 claims
- 0891US6401652B1Plasma reactor inductive coil antenna with flat surface facing the plasmaAPPLIED MATERIALS INC·Filed 2000·Granted Jun 11, 2002·42 cites·42 claims
- 0989US8742665B2Plasma source designLUBOMIRSKY DMITRY·Filed 2010·Granted Jun 3, 2014·20 cites·24 claims
- 1088US10711347B2Micro-volume deposition chamberAPPLIED MATERIALS INC·Filed 2017·Granted Jul 14, 2020·2 cites·19 claims
- 1186US10550472B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2014·Granted Feb 4, 2020·2 cites·4 claims
- 1279US10113231B2Process kit including flow isolator ringAPPLIED MATERIALS INC·Filed 2016·Granted Oct 30, 2018·1 cites·18 claims
- 1376US11512391B2Process kit for a high throughput processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·20 claims
- 1470US12146219B2Flow control features of CVD chambersAPPLIED MATERIALS INC·Filed 2020·Granted Nov 19, 2024·0 cites·21 claims
- 1565US11264213B2Chemical control features in wafer process equipmentAPPLIED MATERIALS INC·Filed 2019·Granted Mar 1, 2022·0 cites·20 claims
- 1663US10724138B2Process kit for a high throughput processing chamberAPPLIED MATERIALS INC·Filed 2018·Granted Jul 28, 2020·0 cites·19 claims
- 1762US5212537ACalibration technique for monochromators and spectrophotometersAPPLIED MATERIALS INC·Filed 1990·Granted May 18, 1993·30 cites·6 claims
- 1858US2017226637A1Process chamber for dielectric gapfillAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 1957US10017855B2Process kit for a high throughput processing chamberAPPLIED MATERIALS INC·Filed 2015·Granted Jul 10, 2018·0 cites·13 claims
- 2057US2014083362A1Process chamber for dielectric gapfillAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 2156US5537508AMethod and dry vapor generator channel assembly for conveying a liquid from a liquid source to a liquid vaporizer with minimal liquid stagnationAPPLIED MATERIALS INC·Filed 1994·Granted Jul 16, 1996·27 cites·23 claims
- 2256US2007281106A1Process chamber for dielectric gapfillAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2355US2007277734A1Process chamber for dielectric gapfillAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2453US11270905B2Modulating film properties by optimizing plasma coupling materialsAPPLIED MATERIALS INC·Filed 2020·Granted Mar 8, 2022·0 cites·20 claims
- 2553US2012073501A1Process chamber for dielectric gapfillLUBOMIRSKY DMITRY·Filed 2011·Application pending·0 cites
- 2648US5129994AMethod and apparatus to inhibit obstruction of optical transmission through semiconductor etch process chamber viewportAPPLIED MATERIALS INC·Filed 1991·Granted Jul 14, 1992·21 cites·25 claims
- 2746US2007289534A1Process chamber for dielectric gapfillAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2846US2012180954A1Semiconductor processing system and methods using capacitively coupled plasmaYANG JANG-GYOO·Filed 2011·Application pending·0 cites
- 2943US10240234B2Gas distribution apparatus for processing chambersAPPLIED MATERIALS INC·Filed 2017·Granted Mar 26, 2019·0 cites·18 claims
- 3035USD946534SRadio frequency conduitAPPLIED MATERIALS INC·Filed 2019·Granted Mar 22, 2022·1 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →