Inventor · disambiguated record
Swaminathan Srinivasan
Also filed as: SRINIVASAN SWAMINATHAN · SRINIVASAN SWAMINATHAN T · SRINIVASAN SWAMINATHAN THANDAL
35 granted patents·24 pending applications·92 citations·filing 1996–2025
96Inventor score
Top patents by PatentIndex Score
59 records- 0197US11574826B2High-density substrate processing systems and methodsAPPLIED MATERIALS INC·Filed 2020·Granted Feb 7, 2023·5 cites·14 claims
- 0295US10607841B2Silicide films through selective depositionAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·4 cites·20 claims
- 0394US9856580B2Apparatus for impurity layered epitaxyAPPLIED MATERIALS INC·Filed 2014·Granted Jan 2, 2018·6 cites·9 claims
- 0491US10128197B2Bottom processingAPPLIED MATERIALS INC·Filed 2016·Granted Nov 13, 2018·6 cites·20 claims
- 0588US8772055B1Multizone control of lamps in a conical lamphead using pyrometersRANISH JOSEPH M·Filed 2013·Granted Jul 8, 2014·6 cites·5 claims
- 0687US12091749B2Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outletAPPLIED MATERIALS INC·Filed 2021·Granted Sep 17, 2024·1 cites·18 claims
- 0786US12060651B2Chamber architecture for epitaxial deposition and advanced epitaxial film applicationsAPPLIED MATERIALS INC·Filed 2021·Granted Aug 13, 2024·1 cites·20 claims
- 0884US10950450B2Silicide films through selective depositionAPPLIED MATERIALS INC·Filed 2020·Granted Mar 16, 2021·1 cites·20 claims
- 0984US9287123B2Techniques for forming angled structures for reduced defects in heteroepitaxy of semiconductor filmsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 15, 2016·4 cites·20 claims
- 1082US10790191B2Selective removal process to create high aspect ratio fully self-aligned viaMICROMATERIALS LLC·Filed 2019·Granted Sep 29, 2020·3 cites·15 claims
- 1182US10026613B2Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor filmsAPPLIED MATERIALS INC·Filed 2017·Granted Jul 17, 2018·2 cites·12 claims
- 1281US9580835B2Multizone control of lamps in a conical lamphead using pyrometersAPPLIED MATERIALS INC·Filed 2016·Granted Feb 28, 2017·2 cites·9 claims
- 1380US9406507B2Utilization of angled trench for effective aspect ratio trapping of defects in strain relaxed heteroepitaxy of semiconductor filmsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 2, 2016·2 cites·12 claims
- 1480US2024337020A1Gas injector for epitaxy and cvd chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1578US10020204B2Bottom processingAPPLIED MATERIALS INC·Filed 2017·Granted Jul 10, 2018·2 cites·20 claims
- 1678US8802522B2Methods to adjust threshold voltage in semiconductor devicesWARD MICHAEL G·Filed 2011·Granted Aug 12, 2014·7 cites·20 claims
- 1777US9870919B2Process chamber having separate process gas and purge gas regionsRANISH JOSEPH M·Filed 2013·Granted Jan 16, 2018·3 cites·9 claims
- 1877US2025246461A1Multi-zone lamp heating and temperature monitoring in epitaxy process chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1975US10077508B2Multizone control of lamps in a conical lamphead using pyrometersAPPLIED MATERIALS INC·Filed 2017·Granted Sep 18, 2018·1 cites·19 claims
- 2074US2025179629A1Conditioning of a processing chamberAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 2173US11978635B2Silicide films through selective depositionAPPLIED MATERIALS INC·Filed 2021·Granted May 7, 2024·0 cites·18 claims
- 2273US2024209544A1Chamber architecture for epitaxial deposition and advanced epitaxial film applicationsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2372US12221694B2Conditioning of a processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted Feb 11, 2025·0 cites·14 claims
- 2471US12074042B2High-density substrate processing systems and methodsAPPLIED MATERIALS INC·Filed 2023·Granted Aug 27, 2024·0 cites·18 claims
- 2571US12018372B2Gas injector for epitaxy and CVD chamberAPPLIED MATERIALS INC·Filed 2021·Granted Jun 25, 2024·0 cites·20 claims
- 2671US9443728B2Accelerated relaxation of strain-relaxed epitaxial buffers by use of integrated or stand-alone thermal processingAPPLIED MATERIALS INC·Filed 2014·Granted Sep 13, 2016·2 cites·20 claims
- 2771US9230837B2Multizone control of lamps in a conical lamphead using pyrometersAPPLIED MATERIALS INC·Filed 2014·Granted Jan 5, 2016·1 cites·20 claims
- 2870US11446740B2Multiple sequential linear powder dispensers for additive manufacturingAPPLIED MATERIALS INC·Filed 2018·Granted Sep 20, 2022·0 cites·11 claims
- 2970US10373823B2Deployment of light energy within specific spectral bands in specific sequences for deposition, treatment and removal of materialsAPPLIED MATERIALS INC·Filed 2018·Granted Aug 6, 2019·1 cites·20 claims
- 3069US11705335B2Conformal high concentration boron doping of semiconductorsAPPLIED MATERIALS INC·Filed 2022·Granted Jul 18, 2023·0 cites·20 claims
- 3168US8871645B2Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereofGANGULY UDAYAN·Filed 2009·Granted Oct 28, 2014·3 cites·12 claims
- 3268US2022367216A1Multi-zone lamp heating and temperature monitoring in epitaxy process chamberAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3367US2014137801A1Epitaxial chamber with customizable flow injectionAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 3467US2018209043A1Epitaxial chamber with customizable flow injectionAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3566US2018065178A1Independently controllable powder delivery for additive manufacturingAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 3662US11328928B2Conformal high concentration boron doping of semiconductorsAPPLIED MATERIALS INC·Filed 2019·Granted May 10, 2022·0 cites·16 claims
- 3760US11037825B2Selective removal process to create high aspect ratio fully self-aligned viaMICROMATERIALS LLC·Filed 2020·Granted Jun 15, 2021·0 cites·10 claims
- 3860US2017203363A1Layerwise heating, linewise heating, plasma heating and multiple feed materials in additive manufacturingAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 3958US9799531B2Utilization of angled trench for effective aspect ratio trapping of defects in strain-relaxed heteroepitaxy of semiconductor filmsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 24, 2017·0 cites·13 claims
- 4056US5696784AReduced mode laser and method of fabricationOPTO POWER CORP·Filed 1996·Granted Dec 9, 1997·23 cites·7 claims
- 4154US2024291736A1System And Method For Determining Mean Opinion Score For Application Quality Of ExperienceSANDVINE CORP·Filed 2024·Application pending·0 cites
- 4252US2018138031A1Process chamber having separate process gas and purge gas regionsAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 4350US9455143B2Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devicesAPPLIED MATERIALS INC·Filed 2015·Granted Sep 27, 2016·0 cites·22 claims
- 4450US2013243971A1Apparatus and Process for Atomic Layer Deposition with Horizontal LaserTHOMPSON DAVID·Filed 2012·Application pending·0 cites
- 4548US2017011917A1Atomic layer epitaxy for semiconductor gate stack layer for advanced channel devicesAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 4648US2020385866A1Rf components with chemically resistant surfacesAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4745US2022028710A1Distribution components for semiconductor processing systemsAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 4844US2015099350A1Enabling high activation of dopants in indium-aluminum-galium-nitride material system using hot implantation and nanosecond annealingAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4942US2017203364A1Additive manufacturing with laser and plasmaAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
- 5042US2017182556A1Additive manufacturing with laser and gas flowAPPLIED MATERIALS INC·Filed 2015·Application pending·0 cites
Showing the top 50 of 59 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →