Inventor · disambiguated record
Gary Leray
Also filed as: LERAY GARY
16 granted patents·3 pending applications·92 citations·filing 2009–2019
90Inventor score
Top patents by PatentIndex Score
19 records- 0197US8988848B2Extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Mar 24, 2015·47 cites·16 claims
- 0295US9595423B2Frequency tuning for dual level radio frequency (RF) pulsingAPPLIED MATERIALS INC·Filed 2016·Granted Mar 14, 2017·13 cites·17 claims
- 0393US11177115B2Dual-level pulse tuningAPPLIED MATERIALS INC·Filed 2019·Granted Nov 16, 2021·8 cites·20 claims
- 0492US9318304B2Frequency tuning for dual level radio frequency (RF) pulsingAPPLIED MATERIALS INC·Filed 2014·Granted Apr 19, 2016·10 cites·20 claims
- 0589US9839109B1Dynamic control band for RF plasma current ratio controlAPPLIED MATERIALS INC·Filed 2016·Granted Dec 5, 2017·8 cites·20 claims
- 0674US10825708B2Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2012·Granted Nov 3, 2020·2 cites·16 claims
- 0764US9190247B2Measurement of plural RF sensor devices in a pulsed RF plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted Nov 17, 2015·1 cites·12 claims
- 0863US9406540B2Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequenciesAPPLIED MATERIALS INC·Filed 2012·Granted Aug 2, 2016·1 cites·20 claims
- 0960US9129777B2Electron beam plasma source with arrayed plasma sources for uniform plasma generationDORF LEONID·Filed 2012·Granted Sep 8, 2015·1 cites·16 claims
- 1058US2019221463A1Process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunabilityAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1155US8951384B2Electron beam plasma source with segmented beam dump for uniform plasma generationDORF LEONID·Filed 2012·Granted Feb 10, 2015·1 cites·16 claims
- 1248US11749504B2Methods and apparatus for common excitation of frequency generatorsAPPLIED MATERIALS INC·Filed 2018·Granted Sep 5, 2023·0 cites·20 claims
- 1348US10553400B2Methods and apparatus for frequency generator and match network communicationAPPLIED MATERIALS INC·Filed 2018·Granted Feb 4, 2020·0 cites·20 claims
- 1444US8894805B2Electron beam plasma source with profiled magnet shield for uniform plasma generationBERA KALLOL·Filed 2012·Granted Nov 25, 2014·0 cites·19 claims
- 1542US10290469B2Enhanced plasma source for a plasma reactorAPPLIED MATERIALS INC·Filed 2014·Granted May 14, 2019·0 cites·17 claims
- 1639US2013098872A1Switched electron beam plasma source array for uniform plasma productionDORF LEONID·Filed 2012·Application pending·0 cites
- 1739US2013098552A1E-beam plasma source with profiled e-beam extraction grid for uniform plasma generationDORF LEONID·Filed 2012·Application pending·0 cites
- 1835US10233912B2Electronegative plasma thruster with optimized injectionCHABERT PASCAL·Filed 2009·Granted Mar 19, 2019·0 cites·18 claims
- 1935US8773020B2Apparatus for forming a magnetic field and methods of use thereofLERAY GARY·Filed 2011·Granted Jul 8, 2014·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →