Process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunability

Abstract

Process kit components for use with a substrate support of a process chamber are provided herein. In some embodiments, a process kit ring may include a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a height of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body.

1 . A process kit ring for use with a substrate support of a process chamber, comprising:
 a ring-shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 15.115 inches to about 15.125 inches and wherein the inner edge has a diameter of about 11.752 inches to about 11.757 inches, and wherein the ring-shaped body has a thickness of about 0.510 inches to about 0.520 inches;   a first step and a second step formed in the ring-shaped body between the outer edge and inner edge, wherein the first step has an outer diameter of about 12.077 inches to about 12.087 inches, and wherein the second step has an outer diameter of about 11.884 inches to about 11.889 inches; and   a ring extending downward from the bottom of the ring shaped body proximate the outer edge of the ring shaped body, the ring having an inner diameter of about 14.905 inches to about 14.915 inches.   
     
     
         2 . The process kit ring of  claim 1 , wherein a transition from a top surface of the second step to the top surface of the ring-shaped body has an angle of about 99 degrees to about 101 degrees with respect to the top surface of the ring shaped body. 
     
     
         3 . The process kit ring of  claim 1 , wherein the inner edge comprises a flat portion configured to interface with a portion of the substrate support. 
     
     
         4 . A process kit ring for use with a substrate support of a process chamber, comprising:
 a ring-shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 15.115 inches to about 15.125 inches and wherein the inner edge has a diameter of about 12.245 inches to about 12.250 inches, and wherein the ring shaped body has a thickness of about 0.520 inches to about 0.530 inches; and   a plurality of protrusions disposed symmetrically about the inner edge of the ring shaped body, the plurality of protrusions extending inwardly from the inner edge towards a center of the ring shaped body.   
     
     
         5 . The process kit ring of  claim 4 , wherein the process kit ring is fabricated from quartz (SiO 2 ). 
     
     
         6 . The process kit ring of  claim 4 , wherein the plurality of protrusions comprise three protrusions disposed about 120 degrees from one another about the inner edge of the ring shaped body. 
     
     
         7 . The process kit ring of  claim 4 , wherein a distance from a center of the ring shaped body to a terminal end of each of the plurality of protrusions is about 5.937 inches to about 5.947. 
     
     
         8 . The process kit ring of  claim 4 , wherein each of the plurality of protrusions has a terminal end that is rounded. 
     
     
         9 . The process kit ring of  claim 4 , wherein a substrate supporting surface of each of the plurality of protrusions is disposed beneath the top surface of the ring shaped body. 
     
     
         10 . The process kit ring of  claim 4 , further comprising a notch formed in the ring shaped body beneath the inner edge of the ring shaped body, the notch having an outer diameter of about 12.405 inches to about 12.505 inches. 
     
     
         11 . The process kit ring of  claim 4 , further comprising a curved transition between a substrate supporting surface of each of the plurality of protrusions and the top surface of the ring shaped body. 
     
     
         12 . The process kit ring of  claim 4 , further comprising a tapered portion extending from the inner edge of the ring shaped body to the top surface of the ring shaped body, wherein an angle between the tapered portion and the top surface of the ring shaped body is about 99 degrees to about 101 degrees. 
     
     
         13 . The process kit ring of  claim 4 , further comprising:
 a ring extending downward from the bottom of the ring shaped body proximate an outer edge of the body, the ring having an inner diameter of about 14.905 inches to about 14.915 inches.   
     
     
         14 . A set of process kit rings for use with a substrate support of a process chamber, comprising:
 a first ring having a ring-shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring-shaped body has a thickness of about 0.116 to about 0.118 inches; and   a second ring disposed on an upper surface of the first ring and configured to extend a height of the set of process kit rings above a processing surface of the substrate.   
     
     
         15 . The set of process kit rings of  claim 14 , wherein the second ring is a singular piece. 
     
     
         16 . The set of process kit rings of  claim 14 , wherein the second ring comprises multiple pieces stacked or interconnected together. 
     
     
         17 . The set of process kit rings of  claim 14 , further comprising:
 a third ring disposed below the first and second rings and configured to isolate a grounding layer disposed below the second ring and prevent arching between the grounding layer and other chamber components.   
     
     
         18 . The set of process kit rings of  claim 14 , wherein the first and second rings are fabricated from silicon carbide (SiC).