Inventor · disambiguated record
Sang-Hun Seo
Also filed as: SEO SANG-HUN
8 granted patents·6 pending applications·284 citations·filing 2000–2024
87Inventor score
Files withSAMSUNG ELECTRONICS CO LTD8CHANG HONG YOUNG2AETHER INC1JUSUNG ENG CO LTD1KOREA ADVANCED INST SCI & TECH1
Top patents by PatentIndex Score
14 records- 0197US6767834B2Method of manufacturing a contact of a semiconductor device using cluster apparatus having at least one plasma pretreatment moduleSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Jul 27, 2004·198 cites·29 claims
- 0288US6534921B1Method for removing residual metal-containing polymer material and ion implanted photoresist in atmospheric downstream plasma jet systemSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Mar 18, 2003·45 cites·26 claims
- 0383US6793767B2Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stageSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Sep 21, 2004·26 cites·13 claims
- 0482US10553406B2Plasma generating apparatus and substrate processing apparatusCHANG HONG YOUNG·Filed 2012·Granted Feb 4, 2020·8 cites·21 claims
- 0556US2020161096A1Plasma generating apparatus and substrate processing apparatusCHANG HONG YOUNG·Filed 2019·Application pending·0 cites
- 0655US2024395583A1Method for generating reference status data for monitoring status of chamber, method for monitoring status of chamber, and apparatus for monitoring status of chamberAETHER INC·Filed 2024·Application pending·0 cites
- 0754US7258811B2Wafer stage including electrostatic chuck and method for dechucking wafer using the wafer stageSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 21, 2007·3 cites·3 claims
- 0848US6465346B2Conducting line of semiconductor device and manufacturing method thereof using aluminum oxide layer as hard maskSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Oct 15, 2002·2 cites·22 claims
- 0947US6855590B2Method of manufacturing the semiconductor device intended to prevent a leakage current from occuring due to a gate induced drain leakage effectSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 15, 2005·1 cites·11 claims
- 1046US7491344B2Method for etching an object using a plasma and an object etched by a plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Feb 17, 2009·1 cites·23 claims
- 1144US2005151173A1Semiconductor device and methods of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1243US2014320016A1Plasma generating apparatus and substrate treating apparatusKOREA ADVANCED INST SCI & TECH·Filed 2014·Application pending·0 cites
- 1342US2013255575A1Plasma generatorJUSUNG ENG CO LTD·Filed 2013·Application pending·0 cites
- 1434US2019006156A1Plasma Processing ApparatusWINTEL CO LTD·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →