Plasma generating apparatus and substrate processing apparatus

Abstract

Provided are a plasma generating apparatus and a substrate treating apparatus. The plasma generating apparatus includes a plurality of ground electrodes arranged inside a vacuum container and extending parallel to each other and power electrodes arranged between the ground electrodes. An area where a distance between the ground electrode and the power electrode is constant exists, and the power electrodes are tapered in a direction facing the substrate. The power electrodes are connected to an RF power source, and height of the power electrode is greater than that of the ground electrode in the direction facing the substrate.

What is claimed is: 
     
         1 . A plasma generating apparatus comprising:
 a gas distribution unit including a plurality of nozzles to output a process gas;   ground electrodes below the gas distribution unit;   a protrusion on a top surface of the ground electrode;   power electrodes between the ground electrodes; and   a power supply unit to supply RF power to the power electrodes,   wherein the process gas is supplied to sides of the protrusion through the nozzles.   
     
     
         2 . The plasma generating apparatus of  claim 1 , wherein the gas distribution unit includes spacers arranged at regular intervals and extending in a first direction, and the nozzles are disposed through the spacers. 
     
     
         3 . The plasma generating apparatus of  claim 1 , wherein the gas distribution unit includes an upper gas distribution plate and a lower gas distribution plate below the upper gas distribution plate, and the lower gas distribution plate includes a first trench extending in a first direction on a top surface of the lower gas distribution plate and connected to the nozzles. 
     
     
         4 . The plasma generating apparatus of  claim 3 , wherein the upper gas distribution plate includes:
 a second trench extending in a second direction intersecting the first direction on a top surface of the upper gas distribution plate; and   a gas supply through-hole in the second trench and aligned with the first trench.   
     
     
         5 . The plasma generating apparatus of  claim 1 , wherein the ground electrodes and the power electrodes are tapered such that a distance therebetween is constant to a predetermined region. 
     
     
         6 . The plasma generating apparatus of  claim 1 , wherein the power electrodes include one or more holes on a surface facing the ground electrodes to induce hollow cathode discharge. 
     
     
         7 . A plasma generating apparatus comprising:
 a gas distribution unit including a plurality of nozzles to output a process gas;   ground electrodes below the gas distribution unit;   a protrusion on a top surface of the ground electrode;   power electrodes between the ground electrodes; and   a power supply unit to supply RF power to the power electrodes,   wherein the ground electrodes and the power electrodes are tapered such that a distance therebetween is constant to a predetermined region.