Inventor · disambiguated record
Martin Jeff Salinas
Also filed as: SALINAS MARTIN · SALINAS MARTIN J · SALINAS MARTIN JEFF
17 granted patents·11 pending applications·93 citations·filing 2005–2020
92Inventor score
Top patents by PatentIndex Score
28 records- 0197US9976211B2Plasma erosion resistant thin film coating for high temperature applicationAPPLIED MATERIALS INC·Filed 2015·Granted May 22, 2018·10 cites·13 claims
- 0294US8617351B2Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reductionHOFFMAN DANIEL J·Filed 2005·Granted Dec 31, 2013·26 cites·10 claims
- 0391US10815562B2Plasma erosion resistant thin film coating for high temperature applicationAPPLIED MATERIALS INC·Filed 2018·Granted Oct 27, 2020·4 cites·20 claims
- 0488US7282675B2Integrated thermal unit having a shuttle with a temperature controlled surfaceSOKUDO CO LTD·Filed 2005·Granted Oct 16, 2007·14 cites·16 claims
- 0585US7297906B2Integrated thermal unit having a shuttle with two-axis movementSOKUDO CO LTD·Filed 2005·Granted Nov 20, 2007·11 cites·13 claims
- 0683US7972469B2Plasma processing apparatusAPPLIED MATERIALS INC·Filed 2007·Granted Jul 5, 2011·7 cites·23 claims
- 0781US10573493B2Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2016·Granted Feb 25, 2020·2 cites·12 claims
- 0878US7601934B2Integrated thermal unit having a shuttle with a temperature controlled surfaceSOKUDO CO LTD·Filed 2007·Granted Oct 13, 2009·6 cites·20 claims
- 0978US7427728B2Zone control heater plate for track lithography systemsSOKUDO CO LTD·Filed 2006·Granted Sep 23, 2008·5 cites·9 claims
- 1077US11773479B2Plasma erosion resistant thin film coating for high temperature applicationAPPLIED MATERIALS INC·Filed 2020·Granted Oct 3, 2023·0 cites·15 claims
- 1176US9514933B2Film deposition using spatial atomic layer deposition or pulsed chemical vapor depositionAPPLIED MATERIALS INC·Filed 2014·Granted Dec 6, 2016·3 cites·18 claims
- 1276US7741585B2Integrated thermal unit having a shuttle with two-axis movementSOKUDO CO LTD·Filed 2007·Granted Jun 22, 2010·5 cites·20 claims
- 1364US2020066563A1Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1462US10468282B2Method and apparatus for substrate transfer and radical confinementAPPLIED MATERIALS INC·Filed 2018·Granted Nov 5, 2019·0 cites·14 claims
- 1559US2011094994A1Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 1655US2013134129A1Inductively coupled plasma apparatusAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1753US2009032522A1Zone control heater plate for track lithography systemsSOKUDO CO LTD·Filed 2008·Application pending·0 cites
- 1851US9857027B2Apparatus and method for self-regulating fluid chemical deliveryAPPLIED MATERIALS INC·Filed 2014·Granted Jan 2, 2018·0 cites·19 claims
- 1950US2008260966A1Plasma processing methodAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2047US10010912B2Particle reduction via throttle gate valve purgeAPPLIED MATERIALS INC·Filed 2014·Granted Jul 3, 2018·0 cites·20 claims
- 2147US8616224B2Methods and apparatus for providing a gas mixture to a pair of process chambersLEE JARED AHMAD·Filed 2010·Granted Dec 31, 2013·0 cites·9 claims
- 2247US2011265951A1Twin chamber processing systemAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2347US2009302002A1Method and apparatus for removing polymer from a substrateAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2444US2008145191A1Actively chilled substrate transport moduleSOKUDO CO LTD·Filed 2007·Application pending·0 cites
- 2541US8562742B2Apparatus for radial delivery of gas to a chamber and methods of use thereofLEE JARED AHMAD·Filed 2010·Granted Oct 22, 2013·0 cites·20 claims
- 2639US2011094683A1Rf feed structure for plasma processingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2738US2011097901A1Dual mode inductively coupled plasma reactor with adjustable phase coil assemblyAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2837US2011269314A1Process chambers having shared resources and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →