Inventor · disambiguated record
Julia Svirchevski
Also filed as: SVIRCHEVSKI JULIA · SVIRCHEVSKI JULIA S
12 granted patents·8 pending applications·150 citations·filing 1998–2008
92Inventor score
Top patents by PatentIndex Score
20 records- 0181US8322045B2Single wafer apparatus for drying semiconductor substrates using an inert gas air-knifeSTEIN NATHAN D·Filed 2008·Granted Dec 4, 2012·10 cites·20 claims
- 0281US7364349B2Chemical dilution system for semiconductor device processing systemAPPLIED MATERIALS INC·Filed 2006·Granted Apr 29, 2008·7 cites·17 claims
- 0378US6543084B2Wafer scrubbing brush coreLAM RES CORP·Filed 2001·Granted Apr 8, 2003·20 cites·5 claims
- 0473US6994611B2Method and system for cleaning a chemical mechanical polishing padLAM RES CORP·Filed 2001·Granted Feb 7, 2006·11 cites·29 claims
- 0572US7686935B2Pad-assisted electropolishingNOVELLUS SYSTEMS INC·Filed 2005·Granted Mar 30, 2010·4 cites·35 claims
- 0670US7270597B2Method and system for chemical mechanical polishing pad cleaningLAM RES CORP·Filed 2005·Granted Sep 18, 2007·3 cites·5 claims
- 0770US6240588B1Wafer scrubbing brush coreLAM RES CORP·Filed 1999·Granted Jun 5, 2001·34 cites·20 claims
- 0869US6170110B1Apparatus for HF-HF cleaningLAM RES CORP·Filed 2000·Granted Jan 9, 2001·13 cites·3 claims
- 0967US7063455B2Chemical dilution system for semiconductor device processing systemAPPLIED MATERIALS INC·Filed 2003·Granted Jun 20, 2006·12 cites·12 claims
- 1055US6352595B1Method and system for cleaning a chemical mechanical polishing padLAM RES CORP·Filed 1999·Granted Mar 5, 2002·13 cites·42 claims
- 1151US6405399B1Method and system of cleaning a wafer after chemical mechanical polishing or plasma processingLAM RES CORP·Filed 1999·Granted Jun 18, 2002·17 cites·17 claims
- 1245US2009266707A1Pad-assisted electropolishingNOVELLUS SYSTEMS INC·Filed 2007·Application pending·0 cites
- 1342US2006255016A1Method for polishing copper on a workpiece surfaceNOVELLUS SYSTEMS INC·Filed 2006·Application pending·0 cites
- 1440US2003054730A1Systems for reducing photo-assisted corrosion in wafers during cleaning processesLAM RES CORP·Filed 2002·Application pending·0 cites
- 1539US2004031167A1Single wafer method and apparatus for drying semiconductor substrates using an inert gas air-knifeFiled 2003·Application pending·0 cites
- 1638US2004200409A1Scrubber with integrated vertical marangoni dryingAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 1736US6093254AMethod of HF-HF CleaningLAM RES CORP·Filed 1998·Granted Jul 25, 2000·6 cites·19 claims
- 1829US2002061718A1Method and system for reducing photo-assisted corrosion in wafers during cleaning processesTREICHEL·Filed 1999·Application pending·0 cites
- 1929US2002031914A1Post-plasma processing wafer cleaning method and systemFiled 1999·Application pending·0 cites
- 2027US2001047810A1High rpm megasonic cleaningFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →