Inventor · disambiguated record
Viachslav Babayan
Also filed as: BABAYAN VIACHSLAV
20 granted patents·6 pending applications·189 citations·filing 2015–2021
94Inventor score
Files withAPPLIED MATERIALS INC26
Top patents by PatentIndex Score
26 records- 0198US9865484B1Selective etch using material modification and RF pulsingAPPLIED MATERIALS INC·Filed 2016·Granted Jan 9, 2018·109 cites·14 claims
- 0297US10203604B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2016·Granted Feb 12, 2019·16 cites·16 claims
- 0397US9964863B1Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2017·Granted May 8, 2018·22 cites·14 claims
- 0497US9829790B2Immersion field guided exposure and post-exposure bake processAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·12 cites·15 claims
- 0595US9958782B2Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2016·Granted May 1, 2018·9 cites·20 claims
- 0692US11550224B2Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·2 cites·20 claims
- 0792US11262662B2Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2020·Granted Mar 1, 2022·2 cites·19 claims
- 0891US10474033B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2017·Granted Nov 12, 2019·4 cites·18 claims
- 0990US11094573B2Method and apparatus for thin wafer carrierAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·3 cites·18 claims
- 1090US11049701B2Biased cover ring for a substrate processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·3 cites·19 claims
- 1189US11112697B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2019·Granted Sep 7, 2021·3 cites·10 claims
- 1282US10615058B2Apparatus for field guided acid profile control in a photoresist layerAPPLIED MATERIALS INC·Filed 2017·Granted Apr 7, 2020·3 cites·20 claims
- 1377US11899366B2Method and apparatus for post exposure processing of photoresist wafersAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·0 cites·10 claims
- 1477US10401742B2Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2018·Granted Sep 3, 2019·1 cites·17 claims
- 1566US10845715B2Post exposure processing apparatusAPPLIED MATERIALS INC·Filed 2019·Granted Nov 24, 2020·0 cites·20 claims
- 1661US10754252B2Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2017·Granted Aug 25, 2020·0 cites·17 claims
- 1759US2018217504A1Apparatus for post exposure bakeAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1856US12057329B2Selective etch using material modification and RF pulsingAPPLIED MATERIALS INC·Filed 2017·Granted Aug 6, 2024·0 cites·10 claims
- 1956US2020048760A1High power impulse magnetron sputtering physical vapor deposition of tungsten films having improved bottom coverageAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2049US2019088457A1Sync controller for high impulse magnetron sputteringAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 2149US2018108519A1POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)APPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2243US10954594B2High temperature vapor delivery system and methodAPPLIED MATERIALS INC·Filed 2015·Granted Mar 23, 2021·0 cites·19 claims
- 2340US10566177B2Pulse shape controller for sputter sourcesAPPLIED MATERIALS INC·Filed 2016·Granted Feb 18, 2020·0 cites·18 claims
- 2438US10858727B2High density, low stress amorphous carbon film, and process and equipment for its depositionAPPLIED MATERIALS INC·Filed 2017·Granted Dec 8, 2020·0 cites·9 claims
- 2538US2018033673A1Substrate support with in situ wafer rotationAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
- 2635US2019127842A1Pulsed dc source for high power impulse magnetron sputtering physical vapor deposition of dielectric films and methods of applicationAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →