Inventor · disambiguated record
Sudhir Gondhalekar
Also filed as: GONDHALEKAR SUDHIR · GONDHALEKAR SUDHIR R · GONDHALEKAR SUDHIR RAM
18 granted patents·11 pending applications·1,180 citations·filing 2000–2025
94Inventor score
Top patents by PatentIndex Score
29 records- 0198US7967913B2Remote plasma clean process with cycled high and low pressure clean stepsAPPLIED MATERIALS INC·Filed 2009·Granted Jun 28, 2011·477 cites·19 claims
- 0297US6450117B1Directing a flow of gas in a substrate processing chamberAPPLIED MATERIALS INC·Filed 2000·Granted Sep 17, 2002·572 cites·61 claims
- 0394US7722737B2Gas distribution system for improved transient phase depositionAPPLIED MATERIALS INC·Filed 2005·Granted May 25, 2010·23 cites·10 claims
- 0486US7354501B2Upper chamber for high density plasma CVDAPPLIED MATERIALS INC·Filed 2002·Granted Apr 8, 2008·39 cites·21 claims
- 0585US9384950B2Chamber coatingsAPPLIED MATERIALS INC·Filed 2015·Granted Jul 5, 2016·4 cites·17 claims
- 0685US7074298B2High density plasma CVD chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jul 11, 2006·23 cites·26 claims
- 0778US2024307908A1Faceplate tensioning method and apparatus to prevent droopAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0876US6682603B2Substrate support with extended radio frequency electrode upper surfaceAPPLIED MATERIALS INC·Filed 2002·Granted Jan 27, 2004·21 cites·17 claims
- 0973US7141138B2Gas delivery system for semiconductor processingAPPLIED MATERIALS INC·Filed 2003·Granted Nov 28, 2006·13 cites·16 claims
- 1072US12011731B2Faceplate tensioning method and apparatus to prevent droopAPPLIED MATERIALS INC·Filed 2021·Granted Jun 18, 2024·0 cites·11 claims
- 1172US8409355B2Low profile process kitRASHEED MUHAMMAD M·Filed 2008·Granted Apr 2, 2013·5 cites·23 claims
- 1272US2025293072A1Electrostatic chuck with improved temperature controlAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1364US2025250665A1Chamber Port AssemblyAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1463US7498268B2Gas delivery system for semiconductor processingAPPLIED MATERIALS INC·Filed 2006·Granted Mar 3, 2009·1 cites·9 claims
- 1562US12322633B2Electrostatic chuck with improved temperature controlAPPLIED MATERIALS INC·Filed 2021·Granted Jun 3, 2025·0 cites·15 claims
- 1662US2008041821A1Gas Distribution System for Improved Transient Phase DepositionAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 1761US12288704B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Granted Apr 29, 2025·0 cites·20 claims
- 1860US8108981B2Method of making an electrostatic chuck with reduced plasma penetration and arcingLUBOMIRSKY DMITRY·Filed 2007·Granted Feb 7, 2012·1 cites·18 claims
- 1956US2006191478A1High density plasma CVD chamberAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2055US9202736B2Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcingNARENDRNATH KADTHALA RAMAYA·Filed 2007·Granted Dec 1, 2015·1 cites·15 claims
- 2155US2006158240A1Distributed temperature control system for point of dispense temperature control on track systems utilizing mixing of hot and cold streamsAPPLIED MATERIALS INC·Filed 2005·Application pending·0 cites
- 2253US2025062104A1Heated pedestal with low impedance rf rodAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2347US11710630B2Plasma block with integrated coolingAPPLIED MATERIALS INC·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 2447US2023402304A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2543US2008006650A1Method and apparatus for multi-chamber exhaust controlAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2639US2004231798A1Gas delivery system for semiconductor processingAPPLIED MATERIALS INC·Filed 2004·Application pending·0 cites
- 2738US11694879B2Component, method of manufacturing the component, and method of cleaning the componentAPPLIED MATERIALS INC·Filed 2019·Granted Jul 4, 2023·0 cites·19 claims
- 2836US2012103970A1Heater with independent center zone controlLUBOMIRSKY DMITRY·Filed 2011·Application pending·0 cites
- 2924USD1027120SSeal for an assembly in a vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted May 14, 2024·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →