Position detection apparatus, exposure apparatus, and method of manufacturing device

Abstract

A position detection apparatus includes an imaging system, an illumination system including a rotary table having first and second aperture stops, both of which can be positioned on the pupil plane of the illumination system, a first image sensor that detects the image of the mark formed by the imaging system, a second image sensor that senses an image of the aperture stop for the imaging system and that of the first aperture stop, and a controller. The controller corrects the first aperture stop so as to reduce the adverse influence of a displacement of the first aperture stop, based on sensed images of the aperture stop for the imaging system and the first aperture stop. Based on the detected position of the image of the mark, the apparatus detects the position of an object to be detected using the illumination light having passed through the corrected first aperture stop.

1. A position detection method using a position detection apparatus that comprises an imaging system configured to form an image of a mark formed on an object to be detected, an illumination system configured to illuminate the mark with illumination light emitted by a light source via a part of the imaging system, and a first image sensor configured to detect the image of the mark formed by the imaging system, and detects a position of the object to be detected based on the position of the image of the mark detected by the first image sensor, the illumination system including a rotary table having a first illumination aperture stop and a second illumination aperture stop, both of which can be positioned on a pupil plane of the illumination system in an optical path of the illumination light between an imaging aperture stop for the imaging system and the light source by rotating the rotary table, the method comprising:
 providing a second image sensor configured to sense an image of the imaging aperture stop and an image of the first illumination aperture stop; 
 causing the second image sensor to sense an image of the imaging aperture stop using the illumination light having passed through the second illumination aperture stop positioned on the pupil plane; 
 positioning the first illumination aperture stop on the pupil plane by rotating the rotary table and causing the second image sensor to sense an image of the first illumination aperture stop using the illumination light having passed through the first illumination aperture stop; and 
 performing a correcting process of correcting the first illumination aperture stop so as to reduce an adverse influence of a displacement of the first illumination aperture stop with respect to the imaging aperture stop, based on the sensed image of the imaging aperture stop and the sensed image of the first illumination aperture stop, 
 wherein, the position detection apparatus detects the position of the object using the illumination light having passed through the first illumination aperture stop having undergone the correcting process. 
 
     
     
       2. The method according to  claim 1 , wherein
 the illumination system further includes a parallel plate which is rotatable about an axis perpendicular to an optical axis of the illumination light and is configured to transmit the illumination light having passed through the first illumination aperture stop, and 
 the correcting process is performed by rotating the rotary table and the parallel plate. 
 
     
     
       3. The method according to  claim 1 , wherein
 the illumination system further includes two parallel plates which are respectively rotatable about two orthogonal axes in a plane perpendicular to an optical axis of the illumination light and are configured to transmit the illumination light having passed through the first illumination aperture stop, and 
 the correcting process is performed by rotating the two parallel plates. 
 
     
     
       4. The method according to  claim 1 , wherein the rotary table includes a plurality of first illumination aperture stops, and the correcting process is performed in accordance with the first illumination aperture stop selected from the plurality of first illumination aperture stops. 
     
     
       5. An exposure method that exposes a substrate via a reticle after the substrate is aligned with the reticle, the method comprising a position detection method for the alignment defined in  claim 1 .