Laser system
Abstract
A laser system comprising: a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam travels to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.
Claims
exact text as granted — not AI-modified1 . A laser system comprising:
a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam propagates to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.
2 . The laser system of claim 1 , wherein the laser comprises an excimer laser.
3 . The laser system of claim 2 , further comprising a pulse stretcher for increasing a pulse length of a pulse in the laser beam.
4 . The laser system of claim 3 wherein the pulse stretcher is arranged between the laser and the first optical element.
5 . The laser system of claim 4 , wherein the pulse stretcher comprises a pulse stretcher output through which a pulse of increased pulse length may exit the pulse stretcher, and wherein the first optical element is located proximal to the pulse stretcher output.
6 . The laser system of claim 1 , further comprising a pulse stretcher for increasing a pulse length of a pulse in the laser beam.
7 . The laser system of claim 6 , wherein the pulse stretcher is arranged between the laser and the first optical element.
8 . The laser system of claim 7 , wherein the pulse stretcher comprises a pulse stretcher output through which a pulse of increased pulse length may exit the pulse stretcher, and wherein the first optical element is located proximal to the pulse stretcher output.
9 . The laser system of claim 8 wherein a distance between the pulse stretcher output and the first optical element is less than the first focal length.
10 . The laser system of claim 1 , wherein the second optical element receives the laser beam directly from the first optical element.
11 . The laser system of claim 1 , further comprising a housing within which the laser and the optical system are disposed, wherein:
the housing has an exit aperture at or proximal to the output of the laser system; and the second optical element is located proximal to the exit aperture.
12 . The laser system of claim 11 , wherein the distance between the exit aperture and the second optical element is less than the first focal length.
13 . The laser system of claim 1 , further comprising:
a second optical system comprising a third optical element and a fourth optical element; wherein the third optical element has a third focal length, the fourth optical element has a fourth focal length equal to the third focal length, and the fourth optical element is spaced from the third optical element along the optical axis by a distance of two times the third focal length.
14 . The laser system of claim 8 , further comprising a second pulse stretcher.
15 . A lithographic apparatus comprising:
a laser system comprising:
a laser operable to generate a laser beam;
an optical system comprising a first optical element and a second optical element; and
an output through which the laser beam exits the laser system;
the laser, optical system and output arranged such that the laser beam propagates to the first optical element, the second optical element and the output sequentially;
wherein the first optical element has a first focal length, the second optical element has a second focal length equal to the first focal length, and the second optical element is spaced from the first optical element by a distance of two times the first focal length.
16 . The lithographic apparatus of claim 15 , further comprising a pulse stretcher for increasing a pulse length of a pulse in the laser beam, wherein
the pulse stretcher is arranged between the laser and the first optical element and the pulse stretcher comprises a pulse stretcher output through which a pulse of increased pulse length may exit the pulse stretcher, and wherein the first optical element is located proximal to the pulse stretcher output.
17 . The lithographic apparatus of claim 15 , further comprising a housing within which the laser and the optical system are disposed, wherein:
the housing has an exit aperture at or proximal to the output of the laser system; and the second optical element is located proximal to the exit aperture.
18 . The lithographic apparatus of claim 17 , wherein the distance between the exit aperture and the second optical element is less than the first focal length.
19 . A laser system comprising:
a laser operable to generate a laser beam; an optical system comprising a first optical element and a second optical element; and an output through which the laser beam exits the laser system; the laser, optical system and output arranged such that the laser beam propagates to the first optical element, the second optical element and the output sequentially; wherein the first optical element has a first focal length, the second optical element has a second focal length, and the second optical element is spaced from the first optical element by a distance substantially equal to the sum of the first focal length and the second focal length.Join the waitlist — get patent alerts
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