Apparatuses and methods for avoiding electrical breakdown from rf terminal to adjacent non-rf terminal

Abstract

An isolation system includes an input junction coupled to one or more RF power supplies via a match network for receiving radio frequency (RF) power. The isolation system further includes a plurality of channel paths connected to the input junction for distributing the RF power among the channel paths. The isolation system includes an output junction connected between each of the channel paths and to an electrode of a plasma chamber for receiving portions of the distributed RF power to output combined power and providing the combined RF power to the electrode. Each of the channel paths includes bottom and top capacitors for blocking a signal of the different type than that of the RF power. The isolation system avoids a risk of electrical arcing created by a voltage difference between an RF terminal and a non-RF terminal when the terminals are placed proximate to each other.

1 . A system comprising:
 a first plurality of filters configured to be coupled to a heater of a plasma chamber and to an electrode of the plasma chamber;   a second plurality of filters coupled to the first plurality of filters, wherein the second plurality of filters is configured to be coupled to a combiner and distributor and to a power source,   wherein the second plurality of filters is configured to filter non-radio frequency power received from the power source and to allow passage of radio frequency (RF) power received from the distributor and combiner to the first plurality of filters,   wherein the first plurality of filters is configured to filter non-RF power received from the power source and allow passage of RF power received from the second plurality of filters to the electrode.   
     
     
         2 . The system of  claim 1 , wherein the first plurality of filters include a plurality of capacitors, and the second plurality of filters include a second plurality of capacitors. 
     
     
         3 . The system of  claim 1 , wherein the first plurality of filters include a first filter and a second filter, wherein the second plurality of filters include a third filter and a fourth filter, wherein the first filter is coupled via a first junction to the third filter and is configured to be coupled via the first junction to the heater. 
     
     
         4 . The system of  claim 3 , wherein the second filter is coupled via a second junction to the fourth filter and is configured to be coupled via the second junction to the heater. 
     
     
         5 . The system of  claim 4 , wherein the first filter is configured to be coupled via a third junction to the electrode and the second filter is configured to be coupled via the third junction to the electrode. 
     
     
         6 . The system of  claim 5 , wherein the third filter is configured to be coupled via a fourth junction to the combiner and distributor and the fourth filter is configured to be coupled via the fourth junction to the combiner and distributor. 
     
     
         7 . The system of  claim 6 , wherein the third filter is configured to be coupled via a fifth junction and a radio frequency filter to the power source and the fourth filter is configured to be coupled via a sixth junction and the radio frequency filter to the power source. 
     
     
         8 . The system of  claim 1 , wherein the non-RF power is alternating current (AC) power. 
     
     
         9 . A plasma system comprising:
 a power source;   a radio frequency (RF) power supply configured to generate a first set of RF signals;   a match network coupled to the RF power supply to receive the first set of RF signals to output a second set of RF signals;   a distributor and combiner coupled to the match network to receive the second set of RF signals to output RF power;   a plasma chamber including a pedestal, wherein the pedestal includes a heater and an electrode;   a first plurality of filters coupled to the heater and to the electrode;   a second plurality of filters coupled to the first plurality of filters, wherein the second plurality of filters is coupled to the combiner and distributor and to the power source,   wherein the second plurality of filters is configured to filter non-RF power received from the power source and to allow passage of the RF power received from the distributor and combiner to the first plurality of filters,   wherein the first plurality of filters is configured to filter non-RF power received from the power source and allow passage of RF power received from the second plurality of filters to the electrode.   
     
     
         10 . The plasma system of  claim 9 , wherein the first plurality of filters include a plurality of capacitors, and the second plurality of filters include a second plurality of capacitors. 
     
     
         11 . The plasma system of  claim 9 , wherein the first plurality of filters include a first filter and a second filter, wherein the second plurality of filters include a third filter and a fourth filter, wherein the first filter is coupled via a first junction to the heater and to the third filter. 
     
     
         12 . The plasma system of  claim 11 , wherein the second filter is coupled via a second junction to the heater and to the fourth filter. 
     
     
         13 . The plasma system of  claim 12 , wherein the first filter is coupled via a third junction to the electrode and the second filter is coupled via the third junction to the electrode. 
     
     
         14 . The plasma system of  claim 13 , wherein the third filter is coupled via a fourth junction to the combiner and distributor and the fourth filter is coupled via the fourth junction to the combiner and distributor. 
     
     
         15 . The plasma system of  claim 14 , wherein the third filter is coupled via a fifth junction and a radio frequency filter to the power source and the fourth filter is coupled via a sixth junction and the radio frequency filter to the power source. 
     
     
         16 . The plasma system of  claim 9 , wherein the non-RF power is alternating current (AC) power. 
     
     
         17 . A method comprising:
 filtering, by a first plurality of filters, non-radio frequency power received from a power source to provide radio frequency (RF) power to an electrode of a plasma chamber, wherein the first plurality of filters is configured to be coupled to a heater of the plasma chamber;   receiving, by a second plurality of filters, RF power from a combiner and distributor; and   filtering, by the second plurality of filters, non-RF power received from the power source to provide the RF power received from the combiner and distributor to the first plurality of filters.   
     
     
         18 . The method of  claim 17 , wherein the first plurality of filters include a plurality of capacitors, and the second plurality of filters include a second plurality of capacitors. 
     
     
         19 . The method of  claim 17 , wherein the non-RF power is alternating current (AC) power. 
     
     
         20 . The method of  claim 17 , wherein the non-RF power is received from the power source via an RF filter.