High precision edge ring centering for substrate processing systems
Abstract
An edge ring centering system for a plasma processing system includes a processing chamber including a substrate support and R edge ring lift pins, where R is an integer greater than or equal to 3. An edge ring includes P grooves located on a bottom surface thereof, where P is an integer greater than or equal to R. A robot arm includes an end effector. A controller is configured to cause the optical sensor to sense a first position of the edge ring on the end effector; cause the robot arm to deliver the edge ring to a first center location on the edge ring lift pins; retrieve the edge ring from the edge ring lift pins; and cause the optical sensor to sense a second position of the edge ring on the end effector.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . An edge ring centering system for a plasma processing system, comprising:
a processing chamber including a substrate support and R edge ring lift pins, where R is an integer greater than or equal to 3; an edge ring including P grooves located on a bottom surface thereof, where P is an integer greater than or equal to R; a robot arm including an end effector; an optical sensor; and a controller configured to:
cause the optical sensor to sense a first position of the edge ring on the end effector;
cause the robot arm to deliver the edge ring to a first center location on the edge ring lift pins;
retrieve the edge ring from the edge ring lift pins; and
cause the optical sensor to sense a second position of the edge ring on the end effector.
2 . The edge ring centering system of claim 1 , wherein the controller is further configured to generate a first offset based on a difference between the second position and the first position.
3 . The edge ring centering system of claim 2 , wherein the controller is further configured to generate a first adjusted center location for the edge ring based on the first center location and the first offset.
4 . The edge ring centering system of claim 3 , wherein the controller is further configured to:
cause the robot arm to deliver the edge ring onto the edge ring lift pins based on the first adjusted center location; retrieve the edge ring from the edge ring lift pins; and cause the optical sensor to sense a third position of the edge ring on the robot arm.
5 . The edge ring centering system of claim 4 , wherein the controller is further configured to generate a second offset based on a difference between the third position and the second position.
6 . The edge ring centering system of claim 5 , wherein the controller is further configured to generate a second adjusted center location based on the first adjusted center location and the second offset.
7 . The edge ring centering system of claim 6 , wherein the controller is further configured to:
cause the robot arm to deliver the edge ring onto the edge ring lift pins based on the second adjusted center location; retrieve the edge ring from the edge ring lift pins; and cause the optical sensor to sense a fourth position of the edge ring on the robot arm.
8 . The edge ring centering system of claim 7 , wherein the controller is further configured to generate a third offset based on a difference between the fourth position and the third position.
9 . The edge ring centering system of claim 8 , wherein the controller is further configured to compare the third offset to a predetermined offset.
10 . The edge ring centering system of claim 8 , wherein the controller is further configured to determine whether the edge ring is centered based on the comparison.
11 . The edge ring centering system of claim 1 , wherein the P grooves are “V”-shaped.
12 . The edge ring centering system of claim 1 , wherein the P grooves are spaced 360°/P around the bottom surface of the edge ring.
13 . The edge ring centering system of claim 1 , wherein the P grooves are “V”-shaped and wherein a bottommost portion of the P grooves extend in a radial direction.Join the waitlist — get patent alerts
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