Radiation Source Module and Lithographic Apparatus
Abstract
A radiation source comprising: a fuel supply device configured to supply fuel; an excitation device configured to excite the fuel into a plasma; a collector configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit; a debris mitigation system configured to collect debris generated by the plasma, the debris mitigation system having a component having a conduit passing therethrough; and a temperature control system configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit.
Claims
exact text as granted — not AI-modified1 - 27 . (canceled)
28 . A radiation source comprising:
a fuel supply device configured to supply fuel; an excitation device configured to excite the fuel into a plasma; a collector configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit; a debris mitigation system configured to collect debris generated by the plasma, the debris mitigation system having a component having a conduit passing therethrough; and a temperature control system configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit.
29 . The radiation source of claim 28 , wherein the temperature control system is operative in a first mode to cool the component to a first temperature that is below the melting point of the fuel and is operative in a second mode to heat the component to a second temperature that is above the melting point of the fuel.
30 . The radiation source of claim 28 , wherein the thermal transfer fluid comprises water.
31 . The radiation source of claim 30 , wherein the thermal transfer fluid is at a pressure greater than atmospheric or greater than about 20 bar.
32 . The radiation source of claim 28 , wherein the thermal transfer fluid comprises air, artificial air, or nitrogen.
33 . The radiation source of claim 32 , wherein the temperature control system comprises a heat exchanger configured to transfer heat from thermal transfer fluid coming from the component to heat transfer fluid heading towards the component.
34 . The radiation source of claim 33 , wherein the temperature control system comprises an active flow control device on the cool side of the heat exchanger.
35 . The radiation source of claim 28 , further comprising:
a vacuum chamber enclosing the collector and debris mitigation system; and wherein all active flow control devices of the temperature control system are outside the vacuum chamber.
36 . The radiation source of claim 28 , wherein the component comprises a source chamber wall, an obscuration member, a scrubber, a vane, a heat shield, a shroud for a fuel supply trajectory, a droplet catcher or a debris bucket.
37 . The radiation source of claim 28 , wherein:
the debris mitigation system comprises a plurality of components each having a conduit passing therethrough, and the temperature control system comprises a plurality of independently controllable circuits configured to circulate the thermal transfer fluid through respective components.
38 . The radiation source of claim 37 , wherein the plurality of independently controllable circuits comprises a first circuit configured to maintain a first set of components at a temperature lower than the melting point of the fuel and a second set of components at a temperature higher than the melting point of the fuel.
39 . The radiation source of claim 28 , wherein the debris mitigation system comprises a plurality of components each having a conduit passing therethrough, and the temperature control system comprises a circuit configured to circulate the thermal transfer fluid through a plurality of the components in series.
40 . The radiation source of claim 28 , wherein the fuel supply device comprises a droplet generator configured to supply droplets of tin as the fuel.
41 . The radiation source of claim 28 , wherein the excitation source comprises a laser.
42 . A lithographic apparatus comprising:
a radiation source comprising:
a fuel supply device configured to supply fuel;
an excitation device configured to excite the fuel into a plasma;
a collector configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit;
a debris mitigation system configured to collect debris generated by the plasma, the debris mitigation system having a component having a conduit passing therethrough; and
a temperature control system configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit;
an illumination system configured to illuminate a patterning device with radiation from the radiation source; and
a projection system arranged to project a pattern from the patterning device onto a substrate.Join the waitlist — get patent alerts
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