Lithographic apparatus and device manufacturing method

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

1 .- 20 . (canceled) 
     
     
         21 . A lithographic apparatus comprising:
 a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;   a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having an aperture, the patterned beam of radiation to be projected through liquid in the space and the aperture onto the substrate, and   a cover member configured to be removably positioned adjacent the projection system so that the cover member substantially closes the aperture and isolates the space from the substrate.   
     
     
         22 . The apparatus according to  claim 21 , wherein the cover member is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the cover member. 
     
     
         23 . The apparatus according to  claim 21 , wherein liquid is in contact with a final lens element of the projection system when the cover member isolates the space from the substrate. 
     
     
         24 . The apparatus according to  claim 21 , wherein the cover member is a plate. 
     
     
         25 . The apparatus according to  claim 21 , wherein the cover member includes a plurality of movable leafs. 
     
     
         26 . The apparatus according to  claim 21 , further comprising an attachment system configured to removably attach the cover member to the liquid supply system. 
     
     
         27 . The apparatus according to  claim 26 , wherein the attachment system includes a magnet, a vacuum outlet or both. 
     
     
         28 . The apparatus according to  claim 21 , wherein the cover member includes a channel in a surface of the cover member facing the aperture. 
     
     
         29 . The apparatus according to  claim 28 , wherein the cover member includes a plurality of radial channels. 
     
     
         30 . The apparatus according to  claim 21 , wherein the cover member is positionable on a substrate table configured to support the substrate so that a first side of the member is substantially coplanar with a primary surface of the substrate. 
     
     
         31 . The apparatus according to  claim 21 , wherein the liquid supply system comprises an inlet to supply liquid onto the substrate and an outlet to remove liquid after the liquid has passed under the projection system. 
     
     
         32 . A lithographic apparatus comprising:
 a projection system configured to project a patterned beam of radiation onto a target portion of a substrate;   a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having an aperture, the patterned beam of radiation to be projected through liquid in the space and the aperture onto the substrate, and   a cover member configured to be removably positioned adjacent the projection system so that the cover member substantially closes the aperture and keeps a final lens element of the projection system in contact with liquid.   
     
     
         33 . The apparatus according to  claim 32 , wherein the cover member is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the cover member. 
     
     
         34 . The apparatus according to  claim 32 , wherein the cover member is a plate. 
     
     
         35 . The apparatus according to  claim 32 , wherein the cover member includes a plurality of movable leafs. 
     
     
         36 . The apparatus according to  claim 32 , further comprising an attachment system configured to removably attach the cover member to the liquid supply system. 
     
     
         37 . The apparatus according to  claim 36 , wherein the attachment system includes a magnet, a vacuum outlet or both. 
     
     
         38 . The apparatus according to  claim 32 , wherein the cover member includes a channel in a surface of the cover member facing the aperture. 
     
     
         39 . The apparatus according to  claim 38 , wherein the cover member includes a plurality of radial channels. 
     
     
         40 . The apparatus according to  claim 32 , wherein the cover member is positionable on a substrate table configured to support the substrate so that a first side of the member is substantially coplanar with a primary surface of the substrate.