Apparatus for processing substrate and method of cleaning same

Abstract

Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

What is claimed is: 
     
         1 . A method of cleaning a apparatus processing a substrate, the method comprising:
 spraying a cleaning solution, from a location having a certain distance from the bottom of a spin head rotatably placed in a container having an open top, to the bottom of a spin head, to clean a salt attached to the bottom of the spin head and supplying a rinse solution downwards to the top of the spin head to perform cleaning on the top of the spin head and the container together,   wherein the rinse solution is supplied to a location deviating from the central part of the spin head,   wherein the spin head alternately rotates in different directions while the rinse solution is supplied.   
     
     
         2 . The method of  claim 1 , wherein the cleaning solution is sprayed by a bottom cleaning member located to be a certain distance from a bottom of the spin head. 
     
     
         3 . The method of  claim 2 , wherein the bottom cleaning member comprises:
 a support arm located to be a certain distance from the bottom of the spin head; and   a first cleaning nozzle provided on the support arm to face the bottom of the spin head.