US2017278680A1PendingUtilityA1

Substrate processing system including coil with rf powered faraday shield

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Assignee: LAM RES CORPPriority: Mar 28, 2016Filed: Mar 23, 2017Published: Sep 28, 2017
Est. expiryMar 28, 2036(~9.7 yrs left)· nominal 20-yr term from priority
Inventors:Shen PengTamarek PandhumsopornAnthony NguyenDan Marohl
H10P 72/0421H01J 37/32155H01J 37/32651H01J 37/32504H01J 2237/334H01J 37/32477H01J 37/32183H01J 37/32431H01J 37/321H01J 37/32715H01J 37/3211H01J 37/32174H01J 37/32091H01L 21/67069H01L 41/332H10N 30/082
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Claims

Abstract

A substrate processing system includes a processing chamber including a dielectric window and a substrate support arranged therein to support a substrate. A coil is arranged outside of the processing chamber adjacent to the dielectric window. A Faraday shield is arranged between the coil and the dielectric window. An RF generator is configured to supply RF power to the coil. The faraday shield is coupled by stray capacitance and/or directly coupled to the Faraday shield. A capacitor is connected to one of the coil and the Faraday shield to adjust a position of a voltage standing wave along the coil.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A substrate processing system comprising:
 a processing chamber including a dielectric window and a substrate support arranged therein to support a substrate;   a coil arranged outside of the processing chamber adjacent to the dielectric window;   a Faraday shield arranged between the coil and the dielectric window; and   an RF generator configured to supply RF power to the coil.   
     
     
         2 . The substrate processing system of  claim 1 , further comprising a capacitor connected to one of the coil and the Faraday shield to alter a position of a voltage standing wave along the coil. 
     
     
         3 . The substrate processing system of  claim 1 , further comprising a tuning circuit arranged between the RF generator and the coil. 
     
     
         4 . The substrate processing system of  claim 3 , wherein the tuning circuit includes:
 a first variable capacitor including a first end connected to the RF generator and a second end;   a second variable capacitor including a first end connected to the second end of the first variable capacitor; and   a third variable capacitor including a first end and a second end, wherein the first end of the third variable capacitor is connected to the second end of the first variable capacitor and the first end of the second variable capacitor and the second end of the third variable capacitor is connected to the coil.   
     
     
         5 . The substrate processing system of  claim 3 , wherein:
 the coil includes a first end and a second end;   the tuning circuit is connected to the first end; and   the second end is connected to the Faraday shield.   
     
     
         6 . The substrate processing system of  claim 5 , wherein the second end corresponds to a center tap of the coil. 
     
     
         7 . The substrate processing system of  claim 5 , further comprising a capacitor including one end connected to the second end and an opposite end connected to a fixed reference potential. 
     
     
         8 . The substrate processing system of  claim 3 , wherein:
 the coil includes a first end and a second end;   the tuning circuit is connected to the first end of the coil; and   the coil is coupled by stray capacitance to the Faraday shield.   
     
     
         9 . The substrate processing system of  claim 8 , further comprising a first capacitor including a first end connected to the Faraday shield and a second end connected to a fixed reference potential. 
     
     
         10 . The substrate processing system of  claim 8 , further comprising a first capacitor including a first end connected to the coil and a second end connected to a fixed reference potential. 
     
     
         11 . The substrate processing system of  claim 8 , further comprising:
 a first capacitor including a first end connected to the Faraday shield and a second end connected to a fixed reference potential; and   a second capacitor including a first end connected to the coil and a second end connected to a fixed reference potential.   
     
     
         12 . The substrate processing system of  claim 3 , wherein:
 the coil includes a first end and a second end;   the tuning circuit is connected to the first end of the coil;   the second end of the coil is connected to the Faraday shield; and   the coil is coupled by stray capacitance to the Faraday shield.   
     
     
         13 . The substrate processing system of  claim 12 , wherein the second end corresponds to a center tap of the coil. 
     
     
         14 . The substrate processing system of  claim 12 , further comprising a capacitor including one end connected to the second end and an opposite end connected to a fixed reference potential. 
     
     
         15 . The substrate processing system of  claim 12 , further comprising a capacitor including a first end connected to the Faraday shield and a second end connected to a fixed reference potential. 
     
     
         16 . The substrate processing system of  claim 12 , further comprising:
 a first capacitor including one end connected to the second end and an opposite end connected to a fixed reference potential.   a second capacitor including a first end connected to the Faraday shield and a second end connected to a fixed reference potential.   
     
     
         17 . The substrate processing system of  claim 1 , wherein the Faraday shield comprises a wire mesh.

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