Substrate treating apparatus

Abstract

A substrate treating apparatus is disclosed. The apparatus may include a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body, a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space, a fluid supplying unit configured to supply fluid into the treatment space, a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space, and an isolation plate installed between the sealing member and the supporting unit. The isolation plate may be provided to face the sealing member.

What is claimed is: 
     
         1 . A substrate treating apparatus, comprising:
 a housing including an upper body and a lower body coupled to each other to define a treatment space, the lower body being provided below the upper body;   a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space;   a fluid supplying unit configured to supply fluid into the treatment space;   a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space; and   an isolation plate installed between the sealing member and the supporting unit,   wherein the isolation plate is provided to face the sealing member.   
     
     
         2 . The substrate treating apparatus of  claim 1 , wherein the isolation plate is provided to have a ring shape. 
     
     
         3 . The substrate treating apparatus of  claim 2 , wherein the isolation plate is installed to the upper body and has a downwardly protruding structure, whose bottom is positioned below a top surface of an inner wall of the lower body. 
     
     
         4 . The substrate treating apparatus of  claim 2 , wherein the supporting unit comprises:
 a vertical portion downwardly extending from the upper body; and   a horizontal portion inwardly extending from an end portion of the vertical portion toward an inner region of the housing and supporting a bottom surface of the substrate.   
     
     
         5 . The substrate treating apparatus of  claim 2 , wherein the fluid supplying unit comprises an upper fluid supplying part configured to directly supply the fluid onto a top surface of the substrate supported by the supporting unit. 
     
     
         6 . The substrate treating apparatus of  claim 1 , wherein the fluid supplied through the fluid supplying unit is a supercritical fluid. 
     
     
         7 . A substrate treating apparatus, comprising:
 a housing including a lower body defining a treatment space whose top is opened and an upper body coupled to the lower body to veil the treatment space;   a supporting unit coupled to the upper body, the supporting unit supporting an edge of a substrate disposed in the treatment space;   a fluid supplying unit configured to supply fluid into the treatment space; and   a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space,   wherein the upper body comprises a protruding portion protruding toward the treatment space and facing the substrate disposed on the supporting unit, and the protruding portion is downwardly extended to have a bottom positioned below a top surface of an inner wall of the lower body.   
     
     
         8 . The substrate treating apparatus of  claim 7 , wherein the upper body is provided to include a plurality of recessed regions formed along an edge of the protruding portion, and the supporting unit is installed to the recessed region. 
     
     
         9 . The substrate treating apparatus of  claim 8 , wherein the supporting unit comprises:
 a vertical portion downwardly extending from the upper body; and   a horizontal portion inwardly extending from an end portion of the vertical portion toward an inner region of the housing and supporting a bottom surface of the substrate.   
     
     
         10 . The substrate treating apparatus of  claim 8 , wherein the fluid supplying unit comprises an upper fluid supplying part configured to directly supply the fluid onto a top surface of the substrate supported by the supporting unit. 
     
     
         11 . The substrate treating apparatus of  claim 7 , wherein the fluid supplied through the fluid supplying unit is a supercritical fluid. 
     
     
         12 . A substrate treating apparatus, comprising:
 a housing including an upper body defining a treatment space whose bottom is opened and a lower body coupled to a bottom surface of the upper body;   a supporting unit coupled to the lower body, the supporting unit supporting an edge of a substrate disposed in the treatment space;   a fluid supplying unit configured to supply fluid into the treatment space; and   a sealing member provided between and in contact with the upper and lower bodies, the sealing member hermetically isolating the treatment space from an outer space,   wherein the sealing member is positioned below the supporting unit.   
     
     
         13 . The substrate treating apparatus of  claim 12 , wherein the supporting unit comprises:
 a vertical portion upwardly extending from the lower body; and   a horizontal portion connected to the vertical portion to support a bottom surface of the substrate.   
     
     
         14 . The substrate treating apparatus of  claim 13 , further comprising an exhausting member provided below the supporting unit to face the substrate disposed on the supporting unit. 
     
     
         15 . The substrate treating apparatus of  claim 12 , wherein the fluid supplied through the fluid supplying unit is a supercritical fluid.