US2015059808A1PendingUtilityA1

Apparatus for processing substrate and method of cleaning same

Assignee: SEMES CO LTDPriority: Aug 30, 2013Filed: Aug 29, 2014Published: Mar 5, 2015
Est. expiryAug 30, 2033(~7.1 yrs left)· nominal 20-yr term from priority
H10P 70/20H10P 70/00H10P 72/0414B08B 3/024B08B 3/02
47
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Claims

Abstract

Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . An apparatus for processing a substrate, the apparatus comprising:
 a spin head on which a substrate is placed;   a container provided to surround the spin head;   an upper nozzle member supplying a processing solution downwards;   a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.   
     
     
         2 . The apparatus of  claim 1 , wherein the bottom cleaning member comprises:
 a support arm located to be a certain distance from the bottom of the spin head; and   a first cleaning nozzle provided on the support arm to face the bottom of the spin head.   
     
     
         3 . The apparatus of  claim 2 , wherein the bottom cleaning member further comprises a second cleaning nozzle that is provided on the support arm to be located on the central part of the spin head with respect to the first cleaning nozzle. 
     
     
         4 . The apparatus of  claim 2 , wherein the bottom cleaning member further comprises:
 a secondary support arm located to be a certain distance from the bottom of the spin head, wherein the secondary support arm is shorten than the support arm; and   a second cleaning nozzle provided on the secondary support arm to be closer to the central part of the spin head than the first cleaning nozzle.   
     
     
         5 . The apparatus of  claim 1 , wherein the spin head comprises:
 a body on which the substrate is placed;   a chuck pin installed on the body to protrude upwards from the body; and   a chuck pin moving unit connected to the lower part of the chuck pin to drive the chuck pin.   
     
     
         6 . The apparatus of  claim 5 , wherein the body comprises a pin hole located to be capable of moving the chuck pin, and a lower hole connected to the pin hole, the pin hole being formed on the top of the body and the lower hole being formed on the lower part of the body. 
     
     
         7 . The apparatus of  claim 6 , wherein the distance between the first cleaning nozzle and the central axis of the spin head is equal to the distance between the lower hole and the central axis of the spin head. 
     
     
         8 . The apparatus of  claim 7 , wherein the body comprises a through hole connected to the pin hole and the lower hole, the through hole being formed on a side of the body. 
     
     
         9 . A method of cleaning a apparatus, the method comprising:
 spraying a cleaning solution, from a location having a certain distance form the bottom of a spin head rotatably placed in a container having an open top, to the bottom of a spin head, to clean a salt attached to the bottom of the spin head.   
     
     
         10 . The method of  claim 9 , wherein the spraying of the cleaning solution is performed while a substrate is placed on the spin head. 
     
     
         11 . The method of  claim 9 , wherein the spraying of the cleaning solution is performed when the spin head rotates. 
     
     
         12 . The method of  claim 9 , wherein the spraying of the cleaning solution is performed simultaneously on locations which have different radii from the central part of the spin head. 
     
     
         13 . The method of  claim 9 , further comprising supplying a rinse solution downwards to the top of the spin head to perform cleaning on the top of the spin head and the container together. 
     
     
         14 . The method of  claim 13 , wherein the rinse solution is supplied to a location deviating from the central part of the spin head. 
     
     
         15 . The method of  claim 14 , wherein the spin head alternately rotates in different directions while the rinse solution is supplied.

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