US2014242501A1PendingUtilityA1

Coating Of Shield Surfaces In Deposition Systems

Assignee: SEMATECH INCPriority: Feb 2, 2012Filed: May 8, 2014Published: Aug 28, 2014
Est. expiryFeb 2, 2032(~5.5 yrs left)· nominal 20-yr term from priority
B82Y 10/00B82Y 40/00C23C 14/34G03F 1/60G03F 1/22C23C 14/564C23C 14/35
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Claims

Abstract

A deposition chamber shield having a stainless steel coating of from about 100 microns to about 250 microns thick wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm 2 of particles between about 1 micron and about 5 microns in size and no particles below about 1 micron in size, and process for production thereof is disclosed.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
         1 . A coated deposition chamber shield, comprising:
 a shield having a stainless steel coating wherein the coated shield has a surface roughness of between about 300 microinches and about 800 microinches and a surface particle density of less than about 0.1 particles/mm 2  of particles between about 1 micron and about 5 microns in size and no particles below about 1 micron in size.   
     
     
         2 . The coated deposition chamber shield of  claim 1 , wherein the coated shield comprises a stainless steel shield. 
     
     
         3 . A deposition method for the production of EUVL mask blank, comprising providing in a deposition chamber the coated shield of  claim 1  and depositing a layer on the blank. 
     
     
         4 . An EUVL mask blank comprising the layer deposited by the method of  claim 3 .

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