Actively heated aluminum baffle component having improved particle performance and methods of use and manufacture thereof

Abstract

An actively heated aluminum baffle component such as a thermal control plate or baffle ring of a showerhead electrode assembly of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer during plasma processing compared to an identically shaped component having a Type III anodized surface.

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         9 . A method of installing an aluminum baffle component having an exposed outer aluminum oxide layer, wherein the outer aluminum oxide layer is formed by an electropolishing procedure in a plasma etch chamber, wherein a used baffle component is removed from a showerhead electrode assembly, the component is cleaned and electropolished to form the electropolished layer and the electropolished component is installed in the showerhead electrode assembly or the used baffle component is replaced with a new baffle component having an outer aluminum oxide layer formed by electropolishing. 
     
     
         10 . A method of manufacturing an aluminum baffle component of a plasma processing chamber, the method comprising forming an exposed outer aluminum oxide layer on the aluminum component such that defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer during plasma processing are reduced compared to defects and particles generated by an identically shaped aluminum component having a Type III anodized layer thereon. 
     
     
         11 . The method of  claim 10 , wherein the outer aluminum oxide layer resulting in reduced defects and particles comprises an unpeelable layer on the aluminum component. 
     
     
         12 . The method of  claim 10 , wherein the outer aluminum oxide layer resulting in reduced defects and particles has a maximum thickness of about 0.5 microns. 
     
     
         13 . The method of  claim 10 , wherein the outer aluminum oxide layer is formed by electropolishing. 
     
     
         14 . The method of  claim 10 , wherein the outer aluminum oxide layer resulting in reduced defects and particles comprises a non-porous layer having a maximum thickness of 0.1 microns adjacent the aluminum component. 
     
     
         15 . The method of  claim 10 , wherein the outer aluminum oxide layer resulting in reduced defects and particles is formed on a used aluminum component. 
     
     
         16 . The method of  claim 10 , wherein the aluminum component comprises a baffle ring. 
     
     
         17 . The method of  claim 10 , wherein the aluminum component comprises a thermal control plate. 
     
     
         18 . The method of  claim 10 , wherein the aluminum comprises an aluminum alloy. 
     
     
         19 . The method of  claim 10 , wherein the aluminum comprises Al 6061-T6. 
     
     
         20 . The method of  claim 10 , wherein the aluminum component is either new or used. 
     
     
         21 . The method of  claim 10  wherein the aluminum component is machined into a desired configuration, cleaned and electropolished to form the oxide layer. 
     
     
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         24 . The method of  claim 26 , wherein the aluminum component comprises the thermal control plate. 
     
     
         25 . The plasma processing apparatus of  claim 26 , wherein the aluminum component comprises a baffle ring located in a plenum between the thermal control plate and the top electrode. 
     
     
         26 . A method of plasma processing, the method comprising processing a semiconductor substrate in the plasma processing apparatus, wherein the plasma processing apparatus comprises a plasma etch chamber having a top showerhead electrode and a bottom electrode, the showerhead electrode comprising part of a showerhead electrode assembly having an actively heated thermal control plate and an actively heated aluminum baffle component having an exposed outer aluminum oxide layer, wherein the outer aluminum oxide layer is formed by an electropolishing procedure.