Exposure Method, Exposure Apparatus, Light Converging Pattern Formation Member, Mask, and Device Manufacturing Method
Abstract
An exposure method includes a first exposure step of irradiating a mask, which is arranged near a plate, with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member, which is arranged near the plate and includes a plurality of light converging portions, with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.
Claims
exact text as granted — not AI-modified1 - 43 . (canceled)
44 . A light converging formation member for use in combination with a mask including a first pattern corresponding to a first light pattern, which is part of a light pattern formed on an exposed body, the light converging formation member comprising:
a plurality of light converging portions for forming a light converging pattern corresponding to a second light pattern, which is another part of the light pattern.
45 . The light converging pattern formation member according to claim 44 , wherein the plurality of light converging portions includes a light converging light shield pattern arranged on the light converging pattern formation member.
46 . The light converging pattern formation member according to claim 45 , wherein:
the mask and the light converging pattern formation member are formed integrally; and the first pattern of the mask includes a light shield pattern.
47 . The light converging pattern formation member according to claim 44 , wherein the mask and the light converging pattern formation member are separate members.
48 . The light converging pattern formation member according to claim 44 , wherein the light converging portion includes a phase diffraction pattern formed on a light transmissive plate.
49 . The light converging pattern formation member according to claim 44 , wherein the light converging portion includes a lens surface formed on a light transmissive plate.
50 . The light converging pattern formation member according to claim 44 , wherein the light converging pattern includes features that are finer than those of the first light pattern formed by the first pattern of the mask.
51 . The light converging pattern formation member according to claim 44 , further comprising:
a light transmissive plate including a first optical surface through which the exposure light enters and a second optical surface arranged closer to the plate than the first optical surface, wherein: the light converging portion is formed on the second optical surface; and the light transmissive plate further includes a held portion formed along a plane that transverses the first optical surface and the second optical surface to hold the light converging pattern formation member.
52 . A mask used in combination with the light converging pattern formation member according to claim 44 , wherein the mask is arrangeable near the exposed body and includes the first pattern.
53 . A designing method for designing the light converging pattern formation member according to claim 44 , the method comprising:
dividing a light pattern that is to be formed on the exposed body into plural sets of light patterns; obtaining a first light pattern from the plural sets of light patterns by extracting at least one light pattern; obtaining a second light pattern from the plural sets of patterns by extracting at least one pattern that differs from the extracted pattern; and obtaining a parameter of the plurality of light converging portions for forming the second light pattern, wherein at least part of the first light pattern and at least part of the second light pattern overlap each other.
54 . The designing method according to claim 53 , wherein the parameter of the light converging portions includes a focal length, numerical aperture, and operating distance of the light converging portions.
55 . The designing method according to claim 53 , wherein the light converging portion includes a light converging light shield pattern arranged on the light converging pattern formation member, the method further comprising:
obtaining a shape of the light converging light shield pattern based on the obtained parameter of the light converging portions.
56 . The designing method according to claim 53 , wherein the light converging portions include a phase diffraction pattern arranged on the light converging pattern formation member, the method further comprising:
obtaining a shape of the phase diffraction pattern based on the obtained parameter of the light converging portions.
57 . The designing method according to claim 53 , wherein the light converging portions include a lens surface formed on the light converging pattern formation member, the method further comprising:
obtaining a shape of the lens surface based on the obtained parameter of the light converging portions.
58 . A mask designing method for designing the mask according to claim 44 , the method comprising:
dividing a light pattern that is to be formed on the exposed body into plural sets of light patterns; obtaining a first light pattern by extracting at least one pattern from the plural sets of light patterns; and generating the first pattern based on the first light pattern.
59 . A manufacturing method for manufacturing the light converging pattern formation member according to claim 44 , the method comprising:
preparing a light transmissive plate; and processing the light transmissive plate based on design data of the plurality of light converging portions for forming the light converging pattern.
60 . The manufacturing method according to claim 59 , wherein:
the light converging portion includes a light converging light shield pattern arranged on the light converging pattern formation member; and said processing includes patterning the light converging light shield pattern on the light transmissive plate based on the design data.
61 . The manufacturing method according to claim 59 , wherein:
the light converging portion includes a phase diffraction pattern formed on the light converging pattern formation member; and said processing includes forming the phase diffraction pattern by etching the light transmissive plate based on the design data.
62 . The manufacturing method according to claim 59 , wherein:
the light converging portion includes a lens surface formed on the light converging pattern formation member; and said processing includes forming the lens surface by etching the light transmissive plate based on the design data.
63 . The manufacturing method according to claim 61 , further comprising:
forming a light shield portion in a region that differs from the light converging portion of the light transmissive plate.
64 . A manufacturing method for manufacturing the mask according to claim 44 , the method comprising:
preparing a light transmissive plate; and processing the light transmissive plate based on information of the first pattern.
65 - 66 . (canceled)Join the waitlist — get patent alerts
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