Structure of substrate supporting table, and plasma processing apparatus

Abstract

Disclosed is the structure of a substrate supporting table wherein corrosion of a bellows is eliminated, generation of dusts from the bellows is suppressed, and the volume and the weight of the sections to be driven are reduced. A plasma processing apparatus is also disclosed. In the substrate supporting table for the plasma processing apparatus ( 10 ), a cylindrical inner tube ( 12 ), the bellows ( 13 ), an outer tube ( 14 ) and a cover member ( 15 ) are sequentially disposed concentrically from the inner side, and a drive member ( 21 ) to be driven by means of a drive mechanism ( 24 ) is attached to the rear surface of the placing table ( 16 ) through an opening ( 11 b) and the inside of the inner tube ( 12 ).

1 . A structure of a substrate supporting table which is used in a processing apparatus using a corrosive gas in a vacuum chamber, and which includes a drive mechanism to change a position of a substrate to be processed, the structure comprising:
 a cylindrical inner tube which has one end portion thereof attached to a periphery of an opening in an inner wall of the vacuum chamber with a first sealing member in between;   a bellows which is disposed on an outer circumferential side of the inner tube, and which has one end portion thereof attached to another end portion of the inner tube with a second sealing member in between;   a cylindrical outer tube which is disposed on an outer circumferential side of the bellows, and which has one end portion thereof attached to another end portion of the bellows with a third sealing member in between;   a disc-shaped placing table which is attached to close an opening in another end portion of the outer tube with a fourth sealing member in between, and on which the substrate is placed;   a cover member which is provided in tight contact with the outer tube to cover an entire surface of the outer tube, and which is made of a corrosion resistant material; and   a drive member which is attached to a back surface of the placing table through the opening in the inner wall of the vacuum chamber and an inside of the inner tube, and which is driven by the drive mechanism.   
     
     
         2 . A structure of a substrate supporting table which is used in a processing apparatus using a corrosive gas in a vacuum chamber, and which includes a drive mechanism to change a position of a substrate to be processed, the structure comprising:
 a cylindrical inner tube which has a lower end portion thereof attached to a periphery of an opening in a bottom portion of the vacuum chamber with a first sealing member in between;   a bellows which is disposed on an outer circumferential side of the inner tube, and which has an upper end portion thereof attached to an upper end portion of the inner tube with a second sealing member in between;   a cylindrical outer tube which is disposed on an outer circumferential side of the bellows, and which has a lower end portion thereof attached to a lower end portion of the bellows with a third sealing member in between;   a disc-shaped placing table which is attached to close an opening in an upper end portion of the outer tube with a fourth sealing member in between, and on which the substrate is placed;   a cylindrical cover member which is provided in tight contact with the outer tube to cover an entire surface of the outer tube, and which is made of a corrosion resistant material; and   a drive member which is attached to a back surface of the placing table through the opening in the inner wall of the vacuum chamber and an inside of the inner tube, and which is driven by the drive mechanism.   
     
     
         3 . The structure of the substrate supporting table according to  claim 1  or  2 , wherein at least one of bonding of the inner tube and the bellows, which is performed instead of using the second sealing member, and bonding of the bellows and the outer tube, which is performed instead of using the third sealing member, is performed. 
     
     
         4 . The structure of the substrate supporting table according to  claim 1  or  2 , wherein a cylindrical exterior member made of a corrosion resistant material is further provided on an outer circumferential side of the cover member to cover an entire surface of the cover member. 
     
     
         5 . The structure of the substrate supporting table according to  claim 1  or  2 , wherein the processing apparatus is a plasma processing apparatus. 
     
     
         6 . A plasma processing device comprising the structure of the substrate supporting table according to  claim 1  or  2 .