Assignee
MATSUDA RYUICHI
JP·3 granted patents·5 pending applications·4 citations·filing 2007–2011
Top patents by PatentIndex Score
8 records- 0169US8662010B2Plasma processing apparatus, plasma processing method, plasma film deposition apparatus, and plasma film deposition methodMATSUDA RYUICHI·Filed 2007·Granted Mar 4, 2014·2 cites·6 claims
- 0269US8480912B2Plasma processing apparatus and plasma processing methodMATSUDA RYUICHI·Filed 2007·Granted Jul 9, 2013·2 cites·3 claims
- 0343US2012132619A1Gas exhaust structure, and apparatus and method for plasma processingMATSUDA RYUICHI·Filed 2010·Application pending·0 cites
- 0440US8960124B2Plasma processing apparatus and plasma processing methodMATSUDA RYUICHI·Filed 2010·Granted Feb 24, 2015·0 cites·1 claims
- 0539US2011297321A1Substrate support stage of plasma processing apparatusMATSUDA RYUICHI·Filed 2009·Application pending·0 cites
- 0637US2013088146A1Inductively coupled plasma generation deviceMATSUDA RYUICHI·Filed 2011·Application pending·0 cites
- 0733US2012111502A1Structure of substrate supporting table, and plasma processing apparatusMATSUDA RYUICHI·Filed 2010·Application pending·0 cites
- 0833US2012135164A1Plasma processing apparatus and plasma processing methodMATSUDA RYUICHI·Filed 2010·Application pending·0 cites
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