Manufacturing method of substrate for a semiconductor package, manufacturing method of semiconductor package, substrate for a semiconductor package and semiconductor package

Abstract

A manufacturing method of a substrate for a semiconductor package includes a resist layer forming step to form a resist layer on a surface of a conductive substrate; an exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area, a light shielding area, and an intermediate transmission area, wherein transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area; a development step to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate; and a plating step to plate on an exposed area to form a metal layer with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate.

1 . A manufacturing method of a substrate for a semiconductor package comprising:
 a resist layer forming step to form a resist layer on a surface of a conductive substrate;   a lithographic exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area, a light shielding area, and an intermediate transmission area disposed between the transmission area and the light shielding area, wherein transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area;   a development step to develop the resist layer and to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate;   a plating step to plate on an exposed area of the substrate by using the resist pattern and to form a metal layer with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate; and   a resist removal step to remove the resist pattern.   
     
     
         2 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 1 ,
 wherein the intermediate transmission area of the mask pattern includes a mixture of a transmission part with the same transmittance as that of the transmission area and a light shielding part with the same transmittance as that of the light shielding area.   
     
     
         3 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 2 ,
 wherein the intermediate transmission area partially includes the transmission part in the light shielding part.   
     
     
         4 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 2 ,
 wherein the intermediate transmission area includes a zigzag border line dividing the transmission part and the light shielding part.   
     
     
         5 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 4 ,
 wherein the hollow of the resist pattern has a side shape including a zigzag shape circumference similar to the zigzag border line in a top surface of the resist pattern, and a smaller zigzag shape circumference than that of the top surface as the circumference approaches the substrate.   
     
     
         6 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 1 ,
 wherein the metal layer is formed with a thickness less than that of the resist pattern in the plating step.   
     
     
         7 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 1 ,
 wherein the metal layer is an electrode for wire bonding or an area for supporting a semiconductor device.   
     
     
         8 . The manufacturing method of the substrate for a semiconductor package as claimed in  claim 1 , further comprising:
 a resist pattern stabilization step to expose the resist pattern between the development step and the plating step.   
     
     
         9 . A manufacturing method of a semiconductor package comprising:
 a resist layer forming step to form a resist layer on a surface of a conductive substrate;   lithographic exposure step to expose the resist layer using a glass mask with a mask pattern including a transmission area, a light shielding area, and an intermediate transmission area disposed between the transmission area and the light shielding area, wherein transmittance of the intermediate transmission area is lower than that of the transmission area and is higher than that of the light shielding area;   a development step to develop the resist layer and to form a resist pattern including a hollow with a side shape including a slope part decreasing in hollow circumference as the hollow circumference approaches the substrate;   a plating step to plate on an exposed area of the substrate by using the resist pattern and to form metal layers with a side shape including a slope part decreasing in circumference as the circumference approaches the substrate;   a resist removal step to remove the resist pattern;   a semiconductor device mounting step to mount a semiconductor device on one of the metal layers of the substrate;   a wire bonding step to connect a terminal of the semiconductor device to another metal layer of the metal layers as an electrode;   a sealing step to seal the semiconductor device mounted on one of the metal layers of the substrate with resin; and   a substrate removal step to remove the substrate from the semiconductor device.