Techniques for matching measured spectra to reference spectra for in-situ optical monitoring
Abstract
A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
Claims
exact text as granted — not AI-modified1 . A method of controlling polishing, comprising:
storing a library having a plurality of reference spectra; polishing a substrate; measuring a sequence of spectra of light from the substrate during polishing; for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra; and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra.
2 . The method of claim 1 , wherein finding a best matching reference spectrum comprises performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
3 . The method of claim 2 , wherein each reference spectrum of the plurality of reference spectra has a stored associated index value, and further comprising determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, and fitting a function to the sequence of index values.
4 . The method of claim 3 , further comprising halting the polishing when the linear function matches or exceeds a target index.
5 . The method of claim 2 , wherein the substrate includes a second layer overlying a first layer, the first layer having a different composition than the second layer.
6 . The method of claim 5 , wherein the second layer is a barrier layer and the first layer is a dielectric layer.
7 . The method of claim 6 , wherein the barrier layer is tantalum nitride or titanium nitride and the dielectric layer is carbon doped silicon dioxide or is formed from tetraethyl ortho silicate.
8 . The method of claim 5 , wherein the function is fit to a portion of the sequence of index values corresponding to spectra measured after detection of exposure of the first layer.
9 . The method of claim 1 , wherein finding a best matching reference spectrum comprises performing a sum of enclidean vector distances between the measured spectrum and each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the lowest sum as a best matching reference spectrum.
10 . The method of claim 1 , wherein finding a best matching reference spectrum comprises performing a sum of derivative differences between the measured spectrum and each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the lowest sum as a best matching reference spectrum.
11 . The method of claim 1 , wherein measuring the sequence of spectra of light from the substrate comprises making a plurality of sweeps of a sensor across the substrate.
12 . The method of claim 8 , wherein each spectrum from the sequence of spectra corresponds to a single sweep of the sensor from the plurality of sweeps.
13 . The method of claim 1 , wherein the substrate includes a plurality of zones, and a polishing rate of each zone is independently controllable by an independently variable polishing parameter, and further comprising:
measuring a sequence of spectra from each zone during polishing; for each measured spectrum in the sequence of spectra for each zone, performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum from the library to generate a sequence of best matching reference spectra; and adjusting the polishing parameter for at least one zone to adjust the polishing rate of the at least one zone such that the plurality of zones have a smaller difference in thickness at the polishing endpoint than without such adjustment.
14 . A method of controlling polishing, comprising:
storing a library having a plurality of reference spectra; polishing a substrate; measuring a sequence of spectra of light from the substrate during polishing; for each measured spectrum of the sequence of spectra, performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum to generate a sequence of best matching reference spectra; and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra.
15 . A polishing apparatus, comprising:
a support to hold a polishing pad; a carrier head to hold a substrate against the polishing pad; a motor to generate relative motion between the carrier head and the support to polish the substrate; an optical monitoring system to measure a sequence of spectra of light from the substrate while the substrate is being polished; and a controller configured to
store a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value,
for each measured spectrum of the sequence of spectra, find a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra; and
determine at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra.
16 . The apparatus of claim 15 , wherein the controller is configured to perform a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and select a reference spectrum with the greatest correlation to the measured spectrum as the best matching reference spectrum.
17 . A computer program product, tangibly embodied in a machine readable storage device, comprising instructions to:
store a library having a plurality of reference spectra; polish a substrate; measure a sequence of spectra of light from the substrate during polishing; for each measured spectrum of the sequence of spectra, find a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra; and determine at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra.
18 . The computer program product of claim 17 , further comprising instructions to perform a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and select a reference spectrum with the greatest correlation to the measured spectrum as the best matching reference spectrum.Join the waitlist — get patent alerts
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