Cleaning member, cleaning method, and device manufacturing method

Abstract

A cleaning member is smaller than a substrate for exposure where exposure light is irradiated, and at least part of a substrate-holding member that holds a rear face of the substrate for exposure is held by the substrate-holding member in order to clean.

1 . A lithographic apparatus comprising:
 a substrate table constructed to hold a substrate;   a recess in the substrate table configured to receive an object; and   a cleaning fluid supply device configured to supply cleaning fluid to at least an outer area of the recess.   
   
   
       2 . The lithographic apparatus of  claim 1 , further comprising a reservoir of cleaning fluid. 
   
   
       3 . The lithographic apparatus of  claim 1 , wherein the cleaning fluid supply device comprises a cleaning fluid inlet into the recess. 
   
   
       4 . The lithographic apparatus of  claim 3 , wherein a position of the cleaning fluid inlet is such that flow of cleaning fluid from the inlet is at least partly radially outwardly relative to a center of the object. 
   
   
       5 . The lithographic apparatus of  claim 3 , wherein the cleaning fluid inlet is moveable relative to the substrate table. 
   
   
       6 . The lithographic apparatus of  claim 5 , wherein the cleaning fluid inlet is in a liquid confinement system configured to at least partly confine immersion liquid to a space between a projection system and the substrate table. 
   
   
       7 . (canceled) 
   
   
       8 . The lithographic apparatus of  claim 3 , wherein the cleaning fluid inlet is formed adjacent an end of an elongate member. 
   
   
       9 . The lithographic apparatus of  claim 8 , wherein the elongate member is a supply pipe. 
   
   
       10 . The lithographic apparatus of  claim 1 , further comprising a controller configured to activate an underpressure source in a drain to remove cleaning fluid from the drain. 
   
   
       11 . The lithographic apparatus of  claim 1 , further comprising a controller configured to control a relative position of at least part of the cleaning fluid supply device and an outer area of a drain so that cleaning fluid can be supplied around the whole periphery of the recess. 
   
   
       12 . The lithographic apparatus of  claim 1 , wherein the apparatus is an immersion lithographic apparatus and comprises a drain in the substrate table to receive immersion liquid which leaks, in use, past an edge of the object into the recess. 
   
   
       13 . The lithographic apparatus of  claim 12 , wherein the drain is in the outer area of the recess. 
   
   
       14 . The lithographic apparatus of  claim 12 , further comprising a controller configured to ensure that a continuous flow of cleaning fluid into the drain is present. 
   
   
       15 . The lithographic apparatus of  claim 12 , wherein the immersion liquid and cleaning fluid are different fluids. 
   
   
       16 . The lithographic apparatus of  claim 1 , wherein the cleaning fluid supply device is configured to provide a cleaning fluid which is comprised of water and at least one component selected from the following components: a surfactant, a solvent, a detergent, a liquefied gas or a dissolved gas. 
   
   
       17 . (canceled) 
   
   
       18 . The lithographic apparatus of  claim 16 , wherein the dissolved gas comprises ozone or hydrogen. 
   
   
       19 . The lithographic apparatus of  claim 1 , further comprising an extraction outlet which is a separate outlet to an outlet of a drain. 
   
   
       20 . The lithographic apparatus of  claim 19 , wherein the extraction outlet is formed adjacent an end of an elongate member. 
   
   
       21 . The lithographic apparatus of  claim 19 , wherein the extraction outlet is moveable relative to the substrate table and/or is part of a liquid confinement system configured to at least partly confine immersion liquid between a projection system and the substrate table. 
   
   
       22 . The lithographic apparatus of  claim 1 , wherein the object is a substrate. 
   
   
       23 . An immersion lithographic apparatus comprising:
 a substrate table constructed to hold a substrate;   a drain in the substrate table configured to receive an immersion fluid which leaks, in use, into a gap between an edge of the substrate table and an object on the substrate table; and   an inlet adjacent an end of an elongate member configured to supply cleaning fluid to (i) the gap, or (ii) an inlet to the drain, or (iii) the drain, or (iv) any combination selected from (i)-(iii).   
   
   
       24 . The immersion lithographic apparatus of  claim 23 , wherein the inlet is positionable such that flow of cleaning fluid from the inlet into the drain is at least partly radially outwardly relative to a center of the object. 
   
   
       25 . The immersion lithographic apparatus of  claim 23 , wherein the inlet is moveable relative to the substrate table. 
   
   
       26 . The immersion lithographic apparatus of  claim 25 , wherein the inlet is on a liquid confinement system configured to at least partly confine immersion liquid to a space between a projection system and the substrate table. 
   
   
       27 . The immersion lithographic apparatus of  claim 23 , wherein the elongate member is in the form of a supply pipe. 
   
   
       28 . The immersion lithographic apparatus of  claim 23 , further comprising an extraction outlet which is a separate outlet to an outlet of the drain. 
   
   
       29 . The immersion lithographic apparatus of  claim 28 , wherein the extraction outlet is formed adjacent an end of an elongate member. 
   
   
       30 . The immersion lithographic apparatus of  claim 23 , wherein the object is a substrate. 
   
   
       31 . A method of cleaning at least a part of a recess in a substrate table configured to receive an object, the method comprising:
 providing a cleaning fluid to at least an outer area of the recess; and   extracting the cleaning fluid from the recess.   
   
   
       32 . The method of  claim 31 , wherein the method is performed when a substrate is present in the recess on the substrate table. 
   
   
       33 . (canceled) 
   
   
       34 . The method of  claim 31 , wherein the substrate table is a substrate table for an immersion lithographic apparatus and comprises a drain in the recess to receive immersion liquid which leaks, in use, past an edge of the object into the recess. 
   
   
       35 . The method of  claim 34 , wherein the cleaning fluid is different from the immersion liquid. 
   
   
       36 . The method of  claim 31 , wherein the cleaning fluid is provided to the recess through an inlet. 
   
   
       37 . (canceled) 
   
   
       38 . The method of  claim 36 , wherein the inlet is moveable relative to the substrate table. 
   
   
       39 . The method of  claim 38 , wherein the method is performed within an immersion lithographic apparatus. 
   
   
       40 . A lithographic projection apparatus comprising:
 a projection system arranged to project a pattern towards a substrate table;   a liquid supply system arranged to supply a cleaning fluid to a gap defined between an edge of the substrate table and a substrate when present; and   an inlet configured to remove excess fluid, wherein in use the inlet is located in the gap and is connected to an under pressure source so as to remove liquid from the gap.