Laser produced plasma euv light source
Abstract
An EUV light source is disclosed that may include a laser source, e.g. CO 2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber. Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, e.g. mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power.
Claims
exact text as granted — not AI-modified1 . An EUV light source comprising;
a laser source; a plasma chamber; and a focusing mirror for focusing a laser beam from said laser source to a focal spot within said plasma chamber.
2 . An EUV light source as recited in claim 1 wherein said focusing mirror is an off-axis parabolic mirror.
3 . An EUV light source as recited in claim 1 wherein said focusing optic is moveable to selectively move the focal spot.
4 . An EUV light source as recited in claim 3 further comprising a target delivery system for delivering a plasma source material to a plasma formation site in the plasma chamber.
5 . An EUV light source as recited in claim 4 wherein said target delivery system comprises a droplet generator.
6 . An EUV light source as recited in claim 4 further comprising a target position detector for generating a signal indicative of target position.
7 . An EUV light source as recited in claim 6 wherein said focusing optic is moveable in response to said signal from said target position detector to locate the focal spot along a target trajectory.
8 . An EUV light source as recited in claim 6 further comprising a steering optic disposed in said plasma chamber for steering the laser beam focal spot in said plasma chamber.
9 . An EUV light source as recited in claim 8 wherein said steering optic and said focusing optic are moveable together in a first direction to move the focal spot along a path parallel to the first direction.
10 . An EUV light source as recited in claim 8 wherein said steering optic is independently moveable in two dimensions.
11 . An EUV light source as recited in claim 8 wherein said steering optic is moveable in response to said signal from said target position detector to locate the focal spot along a target trajectory.
12 . An EUV light source comprising;
a laser source; a plasma chamber; a focusing optic for focusing a laser beam from said laser source to a focal spot within said plasma chamber; and an actuator moving said focusing optic to selectively move the focal point within the plasma chamber.
13 . An EUV light source as recited in claim 12 further comprising a target position detector for generating a signal indicative of target position and wherein said focusing optic is moveable in response to said signal from said target position detector to locate the focal spot along a target trajectory.
14 . An EUV light source as recited in claim 12 further comprising a steering optic for steering the laser beam focal spot in said plasma chamber and wherein said steering optic and said focusing optic are moveable together in a first direction to move the focal spot along a path parallel to the first direction.
15 . An EUV light source comprising;
a laser source; a plasma chamber; a focusing optic for focusing a laser beam from said laser source to a focal spot within said plasma chamber; and an optical assembly to adjust a focal power of said focal spot.
16 . An EUV light source as recited in claim 15 wherein said optical assembly comprises a z-fold telescope.
17 . An EUV light source as recited in claim 16 wherein said z-fold telescope comprises two spherical mirrors.
18 . An EUV light source as recited in claim 15 wherein said focusing optic is a mirror.
19 . An EUV light source as recited in claim 15 further comprising a conical shroud positioned in said chamber to at least partially shield said focusing optic from debris generated in said plasma chamber.
20 . An EUV light source as recited in claim 19 further comprising a system for flowing a gaseous etchant in said shroud.
21 . An LPP EUV light source comprising:
a laser source generating a laser beam; a source material droplet generator to generate droplets for exposure to said laser beam and produce an EUV emission; a detector for measuring an angular EUV emission distribution and outputting a signal indicative thereof; and a control system responsive to said signal to increase a coupling between said laser beam and said droplets.Join the waitlist — get patent alerts
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