Lithographic apparatus and device manufacturing method

Abstract

In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or a combination of one or more linear actuators and one more pins, is used to move the closing plate toward or from the liquid confinement structure. In an embodiment, an adjustment plate is used to compensate for closing plates of varying thickness in closing plate receptacles of varying depth on different substrate tables.

1 .- 33 . (canceled) 
   
   
       34 . A lithographic apparatus comprising:
 at least two tables, of which at least one is constructed to hold a substrate, each of at least two of the tables comprising a receptacle constructed and arranged to receive a closing member;   a projection system configured to project a patterned radiation beam onto a target portion of the substrate; and   a liquid confinement structure configured to provide a liquid between a final element of the projection system and the substrate during projection.   
   
   
       35 . The lithographic apparatus of  claim 34 , wherein the liquid confinement structure is constructed and arranged to couple with the closing member. 
   
   
       36 . The lithographic apparatus of  claim 34 , further comprising a displacement mechanism configured to displace the closing member from at least one of the tables. 
   
   
       37 . The lithographic apparatus of  claim 34 , wherein each of the receptacles further contains an adjustment plate configured to raise the closing member. 
   
   
       38 . The lithographic apparatus of  claim 34 , further comprising a controller configured to cause transfer of a closing member between at least two tables. 
   
   
       39 . A device manufacturing method of exposing, using a projection system, a substrate supported by a first table; the exposure occurring by the projection of a patterned beam through a liquid which is contained by a liquid confinement structure onto the substrate, the method comprising:
 after completion of exposures on the substrate, moving the first table to a position such that a closing member of the first table is positioned under the liquid confinement structure;   while the first table is under the liquid confinement structure, coupling the closing member to the liquid confinement structure;   moving a second table to a position under the liquid confinement structure and the closing member coupled to the liquid confinement structure; and   while the second table is under the liquid confinement structure and the closing member, transferring the closing member from the liquid confinement structure to the second table.   
   
   
       40 . The method of  claim 39 , wherein the second table comprises a receptacle and transferring the closing member from the liquid confinement structure to the second table comprises transferring the closing member to the receptacle. 
   
   
       41 . A lithographic apparatus comprising:
 a first table constructed to hold a substrate;   a second table;   a projection system configured to project a patterned radiation beam onto a target portion of the substrate;   a liquid confinement structure configured to provide a liquid between a final element of the projection system and the substrate during projection; and   a closing member configured to be coupled to the liquid confinement structure,   wherein the apparatus is configured to transfer the closing member between the first and second tables via the liquid confinement structure.   
   
   
       42 . The lithographic apparatus of  claim 41 , wherein each of the first and second tables has a receptacle configured to receive the closing member. 
   
   
       43 . The lithographic apparatus of  claim 41 , wherein the liquid confinement structure is configured to couple with the closing member. 
   
   
       44 . The lithographic apparatus of  claim 41 , further comprising a displacement mechanism configured to move the closing member from at least one of the tables. 
   
   
       45 . A lithographic apparatus comprising:
 a first table constructed to hold a substrate;   a second table;   a projection system configured to project a patterned radiation beam onto a target portion of the substrate;   a liquid confinement structure configured to provide a liquid between a final element of the projection system and the substrate during projection; and   a controller configured to cause the first table to move to a position underneath the projection system for exposure and cause transfer of a closing member from the first table to the liquid confinement structure after exposure, and configured to cause the second table to move to a position underneath the projection system and cause transfer of the closing member from the liquid confinement structure to the second table.   
   
   
       46 . The lithographic apparatus of  claim 45 , constructed and arranged to expose a substrate on the second table. 
   
   
       47 . A device manufacturing method of exposing, using a projection system, a substrate supported by a first table; the exposure occurring by the projection of a patterned beam through a liquid which is contained by a liquid confinement structure onto the substrate, the method comprising:
 moving the first table;   moving a second table with respect to the first table; and   transferring a closing member between the first table and the second table via the liquid confinement structure.   
   
   
       48 . The method of  claim 47 , comprising moving the first table or the second table to a position such that a closing member is positioned under the liquid confinement structure and then coupling the closing member to the liquid confinement structure. 
   
   
       49 . The method of  claim 47 , comprising moving the first table or the second table to a position under the liquid confinement structure and the closing member coupled to the liquid confinement structure and then transferring the closing member from the liquid confinement structure to the first or second table positioned under the liquid confinement structure. 
   
   
       50 . A lithographic apparatus for exposing a substrate via a projection system and a liquid, the apparatus comprising:
 a first table constructed to hold a substrate;   a second table; and   a closing member arranged to be transferred to and from the first and second tables.   
   
   
       51 . The lithographic apparatus of  claim 50 , further comprising a liquid confinement structure configured to keep liquid between the projection system and the substrate and/or the closing member. 
   
   
       52 . The lithographic apparatus of  claim 51 , wherein the closing member is arranged to be transferred to and from the liquid confinement structure. 
   
   
       53 . The lithographic apparatus of  claim 51 , configured to provide a gas seal between the liquid confinement structure and the substrate and/or the closing member to confine the liquid.