Methods of making gas distribution members for plasma processing apparatuses

Abstract

Methods for making gas distribution members for plasma processing apparatuses are provided. The gas distribution members can be electrodes, gas distribution plates, or other members. The methods include fabricating gas injection holes in a gas distribution member by a suitable technique, e.g., a mechanical fabrication technique, measuring gas flow through the gas distribution member, and then adjusting the permeability of the gas distribution member by the same fabrication technique, or by a different technique, e.g., laser drilling. The permeability of the gas distribution member can be adjusted at one or more zones of the member.

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       20 . A gas distribution member for a plasma processing apparatus, comprising:
 mechanically-fabricated first gas injection holes extending between opposed inlet and outlet surfaces of the gas distribution member; and   at least one laser-drilled second gas injection hole extending between the inlet and outlet surfaces.   
   
   
       21 . The gas distribution member of  claim 20 , wherein the gas distribution member has a permeability that provides a substantially uniform gas flow distribution pattern across the surface. 
   
   
       22 . The gas distribution member of  claim 20 , wherein the gas distribution member has a permeability that provides a higher gas flow at a central portion or at a peripheral portion of the gas distribution member. 
   
   
       23 . The gas distribution member of  claim 20 , which is a showerhead electrode of silicon or silicon carbide. 
   
   
       24 . A plasma processing apparatus comprising at least one gas distribution member according to  claim 20 .