Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus

Abstract

A device is provided for transmission image detection of an aerial image formed in a lithographic projection apparatus. The device has a structure provided with an object mark, an projection system and a detector. The object mark is arranged to form a object mark pattern upon illumination by radiation with a predetermined wavelength. The projection system is arranged to form an object mark aerial image of the object mark pattern at an image side of the projection system, where the image side has a numerical aperture larger than 1. The detector has a slit pattern and a photo-sensitive device. The slit pattern is positioned in a plane proximate to image plane of the projection system. The device can be configured to satisfy the following condition: d < 0.85 · λ NA , where d represents a critical dimension of the object mark aerial image at the image plane, λ represents the predetermined wavelength of the radiation, and NA represents the numerical aperture.

1 . A device for transmission image detection of an aerial image formed in a lithographic projection apparatus by radiation of a predetermined wavelength, the device comprising:
 a structure provided with an object mark arranged for forming an object mark pattern upon illumination by said radiation of a predetermined wavelength, the object mark having a critical dimension in a first direction;   a projection system arranged for forming an object mark aerial image of said object mark pattern at an image side of the projection system, said image side having a numerical aperture larger than 1; and   a detector comprising a slit pattern and a photo-sensitive device, the slit pattern being positioned in a plane proximate to an image plane of said projection system and having a critical dimension in said first direction;   wherein   
     
       
         
           
             
               d 
               < 
               
                 0.85 
                 · 
                 
                   λ 
                   NA 
                 
               
             
             , 
           
         
       
     
     wherein where d represents a critical dimension of said object mark aerial image at said image plane, λ represents said predetermined wavelength of said radiation, and NA represents said numerical aperture. 
   
   
       2 . A device for transmission image detection according to  claim 1 , wherein said structure is a mask or a mask table. 
   
   
       3 . A device for transmission image detection according to  claim 1 , wherein said predetermined wavelength is a wavelength between 150 and 200 nm. 
   
   
       4 . A device for transmission image detection according to  claim 1 , wherein said slit pattern comprises a pattern selected from a group of patterns consisting of a single slit pattern and a diffraction grating. 
   
   
       5 . A device for transmission image detection according to  claim 1 , wherein said object mark comprises a pattern selected from a group of patterns consisting of a single slit pattern, an isolated line pattern, and a diffraction grating. 
   
   
       6 . A lithographic apparatus comprising:
 an illumination system configured to provide a beam of radiation;   a support structure configured to support a patterning device that serves to impart said beam of radiation with a pattern in a cross-section of the beam;   a substrate holder configured to hold a substrate;   a projection system configured to expose said substrate to the beam imparted with the pattern; and   a device for transmission image detection of an aerial image formed in the lithographic apparatus by radiation of a predetermined wavelength, wherein said device for transmission image detection comprises a detector and a device structure,   wherein the device structure is provided with an object mark arranged to form an object mark pattern upon illumination by said radiation of a predetermined wavelength,   wherein said projection system is arranged to form an object mark aerial image of said object mark pattern at an image side of the projection system, said image side having a numerical aperture larger than 1,   wherein the detector comprises a slit pattern and a photo-sensitive device, the slit pattern being positioned in a plane proximate to an image plane of said projection system, and   wherein   
     
       
         
           
             
               d 
               < 
               
                 0.85 
                 · 
                 
                   λ 
                   NA 
                 
               
             
             , 
           
         
       
     
     where d represents a critical dimension of said object mark aerial image at said image plane, λ represents said predetermined wavelength of said radiation, and NA represents said numerical aperture of the image side. 
   
   
       7 . A lithographic apparatus according to  claim 6 , wherein the device structure provided in said device for transmission image detection corresponds to said support structure of said lithographic apparatus. 
   
   
       8 . A lithographic apparatus according to  claim 6 , wherein the device structure provided in said device for transmission image detection corresponds to said patterning device. 
   
   
       9 . A method for transmission image detection of an aerial image formed in a lithographic projection apparatus by radiation of a predetermined wavelength, said method comprising:
 providing a structure with an object mark, said object mark having a critical dimension in a first direction;   providing a detector comprising a slit pattern and a photo-sensitive device, said slit pattern having a critical dimension in said first direction;   providing a projection system between said structure and said detector such that said slit pattern is positioned in a plane proximate to an image plane of said projection system;   forming an object mark pattern upon illumination of said object mark by said radiation with a predetermined wavelength;   forming an object mark aerial image of said object mark by said projection system at an image side of said projection system, said image side having a numerical aperture larger than 1;   selecting a portion of said aerial image using said slit pattern; and   detecting, using said photo-sensitive device, said portion of said aerial image as selected by said slit pattern,   wherein   
     
       
         
           
             
               d 
               < 
               
                 0.85 
                 · 
                 
                   λ 
                   NA 
                 
               
             
             , 
           
         
       
     
     where d represents a critical dimension of said object mark aerial image at said image plane, λ represents said predetermined wavelength of said radiation, and NA represents said numerical aperture.