US2008122029A1PendingUtilityA1
Inductor utilizing pad metal layer
Est. expiryNov 3, 2026(~0.3 yrs left)· nominal 20-yr term from priority
H10D 1/20
41
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Claims
Abstract
An inductor utilizing a pad metal layer. The inductor comprises a metal spiral, a metal bridge, and a metal interconnect. The metal bridge is formed with the pad metal layer and a plurality of vias and has one end connected to the metal spiral. The metal interconnect is connected to the other end of the metal bridge. In addition, resistivity of the pad metal layer is lower than that of the metal spiral.
Claims
exact text as granted — not AI-modified1 . An inductor utilizing a pad metal layer, comprising:
a metal spiral; a metal bridge formed with the pad metal layer and a plurality of vias, the metal bridge having one end connected to the metal spiral; and a metal interconnect connected to the other end of the metal bridge.
2 . The inductor as claimed in claim 1 , wherein resistivity of the pad metal layer is lower than that of the metal spiral.
3 . The inductor as claimed in claim 1 , wherein the metal spiral is formed with a top metal layer.
4 . The inductor as claimed in claim 3 , wherein the metal interconnect is formed with the top metal layer.
5 . The inductor as claimed in claim 3 , wherein the top metal layer comprises a copper-containing layer and the pad metal layer comprises an aluminum-containing layer.
6 . The inductor as claimed in claim 5 , wherein thickness of the top metal layer ranges from about 1.5 KÅ to 50 KÅ.
7 . The inductor as claimed in claim 5 , wherein thickness of the pad metal layer ranges from about 5 KÅ to 40 KÅ.
8 . The inductor as claimed in claim 1 , wherein the metal spiral is lower than the pad metal layer.
9 . An inductor utilizing a pad metal layer, comprising:
a metal spiral; a metal bridge formed with a first metal layer and a plurality of vias, the metal bridge having one end connected to the metal spiral; and a metal interconnect connected to the other end of the metal bridge, wherein the metal spiral and the metal interconnect are formed with a second metal layer and the pad metal layer disposed thereon and the first metal layer is lower than the second metal layer.
10 . The inductor as claimed in claim 1 , wherein the first and second metal layers comprise copper-containing layers and the pad metal layer an aluminum-containing layer.
11 . The inductor as claimed in claim 10 , wherein thickness of the second metal layer ranges from about 1.5 KÅ to about 50 KÅ.
12 . The inductor as claimed in claim 10 , wherein thickness of the pad metal layer ranges from about 5 KÅ to about 40 KÅ.
13 . An inductor utilizing a pad metal layer, comprising:
a metal spiral; a metal bridge formed with a first metal layer and a plurality of vias and having one end connected to the metal spiral; and a metal interconnect connected to the other end of the metal bridge; wherein the metal spiral and the metal interconnect are formed with a second metal layer and the pad metal layer coupled thereto and the first metal layer is lower than the second metal layer.
14 . The inductor as claimed in claim 13 , wherein the first and second metal layers comprise copper-containing layers and the pad metal layer an aluminum-containing layer.
15 . The inductor as claimed in claim 13 , wherein thickness of the second metal layer ranges from 1.5 KÅ to 50 KÅ.
16 . The inductor as claimed in claim 13 , wherein thickness of the pad metal layer ranges from 5 KÅ to 40 KÅ.Join the waitlist — get patent alerts
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