Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus

Abstract

A device manufacturing method includes using a patterning device to impart a beam of radiation with a pattern in its cross-section, projecting the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate, and projecting a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate. A cross-section of the beam projected on the substrate edge target portion has an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate. A part of the cross-section of the beam is incident on the substrate, and another part of the cross-section of the beam is not incident on the substrate.

1 . A device manufacturing method, comprising: 
 using a patterning device to impart a beam of radiation with a pattern in its cross-section;    projecting the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate; and    projecting a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate, wherein a cross-section of the beam projected on the substrate edge target portion has an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate, a part of the cross-section of the beam is incident on the substrate, and another part of the cross-section of the beam is not incident on the substrate.    
   
   
       2 . The method of  claim 1 , further comprising: 
 determining the area of the cross-section of the beam projected on the substrate edge target portion; and    using a beam masking device to define the cross-section of the beam.    
   
   
       3 . The method of  claim 1 , further comprising using a beam masking device to change a position of an edge of said cross-section in a direction substantially perpendicular to a scan direction while scanning said substrate in a scan direction during said projecting onto the substrate edge target portion.  
   
   
       4 . The method of  claim 1 , wherein the cross-section of the beam has a quadrilateral shape.  
   
   
       5 . The method of  claim 4 , wherein the substrate edge target portion has an area substantially the same as the area of the plurality of target portions of substantially the same area within the periphery of the substrate and the quadrilateral shape of the cross-section of the beam has the smallest area capable of at least covering the substrate.  
   
   
       6 . The method of  claim 1 , wherein a pattern exposed in the substrate edge target portion forms a dummy structure that is not part of a functional device made in the method.  
   
   
       7 . The method of  claim 1 , further comprising exposing a plurality of substrate edge target portions around the edge of a circular substrate.  
   
   
       8 . A computer program, embodied in a machine-readable medium, for configuring a lithographic apparatus, the program comprising program code that, when executed: 
 determines a cross-section of a beam of radiation to be projected on a substrate edge target portion overlapping an edge of a substrate, the cross-section having an area smaller than the area of a plurality of target portions of substantially a same area within a periphery of the substrate, a part of the cross-section of the beam is to be incident on the substrate, and another part of the cross-section of the beam is not to be incident on the substrate; and    makes the cross-section available to the lithographic apparatus for projecting a beam of radiation having the cross-section onto the substrate edge target portion.    
   
   
       9 . The computer program of  claim 8 , further comprising program code that, when executed, instructs the lithographic apparatus to project a beam of radiation having the cross-section onto the substrate edge target portion.  
   
   
       10 . The computer program of  claim 9 , further comprising program code that, when executed, instructs the lithographic apparatus to change a position of an edge of said cross-section in a direction perpendicular to a scan direction while scanning said substrate in a scan direction during said projecting onto the substrate edge target portion.  
   
   
       11 . The computer program of  claim 8 , wherein the cross-section has a quadrilateral shape.  
   
   
       12 . The computer program of  claim 11 , wherein the substrate edge target portion has an area substantially the same as the area of the plurality of target portions of substantially the same area within the periphery of the substrate and the quadrilateral shape of the cross-section of the beam has the smallest area capable of at least covering the substrate.  
   
   
       13 . The computer program of  claim 8 , wherein a pattern exposed in the substrate edge target portion forms a dummy structure that is not part of a functional device.  
   
   
       14 . The computer program of  claim 8 , further comprising program code that, when executed, instructs the lithographic apparatus to use a patterning device to impart a beam of radiation with a pattern in its cross-section and to project the patterned beam of radiation onto the plurality of target portions of substantially the same area within a periphery of the substrate.  
   
   
       15 . A lithographic projection apparatus comprising: 
 an illumination system configured to condition a beam of radiation;    a support structure configured to hold a patterning device, the patterning device configured to pattern the beam according to a desired pattern;    a substrate table configured to hold a substrate; and    a projection system configured to project the patterned beam of radiation onto a plurality of target portions of substantially the same area within a periphery of the substrate and to project a beam of radiation onto a substrate edge target portion overlapping an edge of the substrate; and    a controller configured to control formation of a cross-section of the beam to be projected onto the substrate edge target portion, the cross-section having an area smaller than the area of the plurality of target portions of substantially the same area within the periphery of the substrate, a part of the cross-section of the beam is to be incident on the substrate, and another part of the cross-section of the beam is not to be incident on the substrate.    
   
   
       16 . The lithographic apparatus of  claim 15 , wherein the controller is further configured to control a change of a position of an edge of said cross-section in a direction perpendicular to a scan direction while scanning said substrate in a scan direction during said projecting onto the substrate edge target portion.  
   
   
       17 . The lithographic apparatus of  claim 15 , wherein the cross-section has a quadrilateral shape.  
   
   
       18 . The lithographic apparatus of  claim 17 , wherein the substrate edge target portion has an area substantially the same as the area of the plurality of target portions of substantially the same area within the periphery of the substrate and the quadrilateral shape of the cross-section of the beam has the smallest area capable of at least covering the substrate.  
   
   
       19 . The lithographic apparatus of  claim 15 , wherein a pattern to be exposed in the substrate edge target portion forms a dummy structure that is not part of a functional device.