Lithographic apparatus, programmable patterning structure, device manufacturing method, and device manufactured thereby

Abstract

Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.

1 - 28 . (canceled)  
   
   
       29 . A method of forming a patterned beam comprising: 
 patterning a beam of radiation in accordance with a configuration of a plurality of pixel elements, the pixel elements comprising a solid state electro-optical material; 
 applying a voltage to vary a birefringence of the solid state electro-optical material;  
 modulating an amplitude of radiation that is incident on the pixel elements; and  
 altering a configuration of the plurality of pixel elements.  
   
   
   
       30 . A method of forming a patterned beam comprising: 
 patterning a beam of radiation in accordance with a configuration of a plurality of pixel elements, the pixel elements comprising a solid state electro-optical material; 
 applying a voltage to vary a birefringence of the solid state electro-optical material;  
 modulating a phase of radiation that is incident on the pixel elements; and  
 altering a configuration of the plurality of pixel elements.  
   
   
   
       31 . A programmable patterning structure comprising: 
 a plurality of pixel elements, at least a portion of the pixel elements each comprising a layer of solid state electro-optical material having a birefringence that varies according to an applied voltage;    at least one electrode configured to apply a voltage to the layer in order to vary the birefringence of the electro-optical material; and    wherein the pixel elements are configured to independently modulate an amplitude and a phase of radiation that is incident thereon.