Low contamination plasma chamber components and methods for making the same
Abstract
Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.
Claims
exact text as granted — not AI-modified1 . A method of making a plasma reactor component having one or more surfaces which are exposed to plasma during use, the method comprising plasma spraying a coating material onto a plasma exposed surface of the component to form a coating having surface roughness characteristics that promote the adhesion of polymer deposits.
2 . The method of claim 1 , further comprising steps of;
roughening the plasma exposed surface of the component; and cleaning the roughened surface prior to plasma spraying the coating material.
3 . The method of claim 1 , further comprising cleaning exposed surfaces of the plasma sprayed coating.
4 . The method of claim 1 , wherein the coating material is a ceramic or a polymeric material.
5 . The method of claim 1 , wherein the component has openings therethrough, the method further comprising plugging the openings before plasma spraying the coating.
6 . The method of claim 1 , further comprising removing the component from a plasma reaction chamber and cleaning the plasma exposed surface thereof by removing any existing coating and/or adhered polymer deposits therefrom prior to plasma spraying the coating onto the cleaned surface.
7 . The method of claim 4 , wherein the plasma sprayed coating is a ceramic material having a thickness of 2 to 5 mils.
8 . The method of claim 4 , wherein the component and the coating material comprise the same ceramic material.
9 . The method of claim 4 , wherein the coating material is a polyimide.
10 . The method of claim 9 , wherein the coating has a thickness of 10 to 30 mils.
11 . The method of claim 1 , wherein the component is selected from the group consisting of a plasma confinement ring, a focus ring, a pedestal, a chamber wall, a chamber liner and a gas distribution plate.
12 . The method of claim 2 , wherein the roughening step comprises bead blasting the surface of the component.
13 . The method of claim 1 , wherein the coating has an arithmetic mean surface roughness value (Ra) of between 150 and 190 micro-inches.
14 - 31 . (Canceled).
32 . The method of claim 1 , wherein the component comprises aluminum having an anodized or non-anodized plasma exposed surface.
33 . The method of claim 1 , wherein the component is made from a ceramic material selected from the group consisting of alumina, yttria, zirconia, silicon carbide, silicon nitride, boron carbide and boron nitride.
34 . The method of claim 1 , wherein the coating has an as-sprayed surface roughness that promotes the adhesion of polymer deposits.
35 . The method of claim 1 , wherein the component comprises a plasma sprayed coating on a plasma exposed surface thereof, wherein the coating has surface roughness characteristics that promote the adhesion of polymer deposits.
36 . The method of claim 1 , wherein the coating is a ceramic or polymeric material.Join the waitlist — get patent alerts
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