Illuminator controlled tone reversal printing

Abstract

A method of reversing the tone of an image to be printed in a layer of radiation sensitive material formed on a substrate includes defining a lithographic problem, the problem including a lithographic feature to be positively and negatively printed; designing a patterning device, the patterning device including a pattern, the pattern including the lithographic feature; determining a first illumination arrangement capable of positively printing the lithographic feature; determining a second illumination arrangement capable of negatively printing the lithographic feature; and switching the first illumination arrangement to the second illumination arrangement.

What is claimed is:  
     
         1 . A method of reversing a tone of an image to be printed in a layer of radiation sensitive material formed on a substrate, the method comprising: 
 defining a lithographic problem, the problem including a lithographic feature to be positively and negatively printed;    designing a patterning device, the patterning device including a pattern, the pattern including the lithographic feature;    determining a first illumination arrangement capable of positively printing the lithographic feature;    determining a second illumination arrangement capable of negatively printing the lithographic feature; and    switching the first illumination arrangement to the second illumination arrangement.    
     
     
         2 . A method according to  claim 1 , wherein determining the first illumination arrangement includes selecting a multipole illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes rotating poles of the first illumination arrangement.  
     
     
         3 . A method according to  claim 2 , wherein switching the first illumination arrangement further includes modifying the radii and angle of the poles of the first illumination arrangement.  
     
     
         4 . A method according to  claim 1 , wherein determining the first illumination arrangement includes selecting a small sigma illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes changing the small sigma illumination arrangement to an annular illumination arrangement.  
     
     
         5 . A method according to  claim 1 , wherein designing the patterning device includes designing at least one of assist features and a phase shifting region of the patterning device.  
     
     
         6 . A device for use in integrated circuits, integrated optical systems, patterns for magnetic domain memories, liquid-crystal display panels, thin-film magnetic heads, printed wiring boards, and nanomagnet fabrications, the device manufactured by a method comprising: 
 defining a lithographic problem, the problem including a lithographic feature to be positively and negatively printed;    designing a patterning device, the patterning device including a pattern, the pattern including the lithographic feature;    determining a first illumination arrangement capable of positively printing the lithographic feature;    providing a substrate at least partially covered by a layer of radiation sensitive material;    projecting a projection beam, having the first illumination arrangement and endowed with a pattern in its cross section using the patterning device, onto a first target portion of the radiation sensitive material with a projection beam endowed;    determining a second illumination arrangement capable of negatively printing the lithographic feature;    switching the first illumination arrangement to the second illumination arrangement; and    projecting the projection beam, having the second illumination arrangement and endowed with the pattern in its cross section using the patterning device, onto a second target portion of the layer of radiation sensitive material.    
     
     
         7 . A device according to  claim 6 , wherein determining the first illuminator arrangement includes selecting a multipole illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes rotating poles of the first illumination arrangement.  
     
     
         8 . A device according to  claim 7 , wherein switching the first illumination arrangement further includes modifying the radii and angle of the poles of the first illumination arrangement.  
     
     
         9 . A device according to  claim 6 , wherein determining the first illumination arrangement includes selecting a small sigma illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes changing the small sigma illumination arrangement to an annular illumination arrangement.  
     
     
         10 . A device according to  claim 6 , wherein designing the patterning device includes designing at least one of assist features and a phase shifting region of the mask.  
     
     
         11 . A method of reversing a tone of an image to be printed in a layer of radiation sensitive material formed on a substrate using an illumination arrangement generated by an illumination system including a plurality of optical elements along an optical axis, the method comprising: 
 defining a lithographic problem, the problem including a lithographic feature to be positively and negatively printed;    designing a patterning device, the patterning device including a pattern, the pattern including the lithographic feature that is to be positively and negatively printed;    determining a first illumination arrangement capable of positively printing the lithographic feature;    determining a second illumination arrangement capable of negatively printing the lithographic feature; and    switching the first illumination arrangement to the second illumination arrangement by adjusting a position of at least one of the optical elements.    
     
     
         12 . A method according to  claim 11 , wherein determining the first illumination arrangement includes selecting a multi-pole illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes rotating poles of the first illumination arrangement.  
     
     
         13 . A method according to  claim 12 , wherein switching the first illumination arrangement further includes modifying the radii and angle of the poles of the first illumination arrangement.  
     
     
         14 . A method according to  claim 11 , wherein determining the first illumination arrangement includes selecting a small sigma illumination arrangement and switching the first illumination arrangement to the second illumination arrangement includes changing the small sigma illumination arrangement to an annular illumination arrangement.  
     
     
         15 . A method according to  claim 11 , wherein designing the patterning device includes designing at least one of assist features and a phase shifting region of the patterning device.