US2004194708A1PendingUtilityA1

Method of cleaning a cvd device

Assignee: ANELVA CORPPriority: Jan 22, 2001Filed: May 18, 2004Published: Oct 7, 2004
Est. expiryJan 22, 2021(expired)· nominal 20-yr term from priority
Inventors:Hiroshi Nogami
C23C 16/4405Y10S134/902Y10S438/905H01J 37/32862
51
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Claims

Abstract

A CVD vacuum vessel including an electrically conductive partition plate which divides the interior of the vacuum vessel into a plasma generating space and a film-deposition processing space, and an electrically conductive spiral shield. The electrically conductive partition plate has a plurality of through-holes connecting the plasma generating space to the film-deposition processing space and a heater for heating the electrically conductive partition plate. The partitioning plate is mounted to the vacuum vessel by means of a mounting screw such that electrical contact between the partitioning plate and the vacuum vessel is achieved through said spiral shield.

Claims

exact text as granted — not AI-modified
1 . A CVD apparatus comprising: 
 a vacuum vessel separated into two chambers;    the first one of the two chambers containing a radio-frequency electrode;    the second one of the two chamber containing a substrate support mechanism for mounting a substrate;    wherein said vacuum vessel is separated by an electrically conductive partitioning section, said partitioning section comprising:    a plurality of through-holes to allow communication between the first chamber and the second chamber;    an interior space for receiving a reactive gas, the interior space separated from the first chamber and communicating with the second chamber through a plurality of diffusion holes; and    a heater for heating the electrically conductive partition section.    
     
     
         2 . The apparatus of  claim 1 , further comprising: 
 an electrically conductive spiral shield; and    wherein the partitioning section is mounted to the vacuum vessel by means of a mounting screw such that electrical contact between the partitioning section and the vacuum vessel is achieved through said spiral shield.    
     
     
         3 . A CVD apparatus comprising: 
 a vacuum vessel separated into two chambers;    at least one radio-frequency electrode contained in a first one of said two chambers;    a substrate support mechanism contained in the second one of said two chambers;    an electrically conductive partition section;    an electrically conductive spiral shield; and    wherein said vacuum vessel is separated into two chambers by said electrically conductive partition section which is mounted to said vacuum vessel by means of a mounting screw such that electrical contact between the partitioning section and the vacuum vessel is achieved through said spiral shield.

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