Assignee
ANELVA CORP
JP·246 granted patents·17 pending applications·10,182 citations·filing 1980–2011
Top patents by PatentIndex Score
263 records- 0199US5494494AIntegrated module multi-chamber CVD processing system and its method for processing substratesANELVA CORP·Filed 1994·Granted Feb 27, 1996·666 cites·25 claims
- 0297US6892669B2CVD apparatusANELVA CORP·Filed 2001·Granted May 17, 2005·233 cites·31 claims
- 0397US6245396B1CVD apparatus and method of using sameANELVA CORP·Filed 1999·Granted Jun 12, 2001·292 cites·10 claims
- 0497US5891349APlasma enhanced CVD apparatus and process, and dry etching apparatus and processANELVA CORP·Filed 1996·Granted Apr 6, 1999·308 cites·36 claims
- 0597US4399016APlasma device comprising an intermediate electrode out of contact with a high frequency electrode to induce electrostatic attractionANELVA CORP·Filed 1982·Granted Aug 16, 1983·121 cites·14 claims
- 0696US6462482B1Plasma processing system for sputter deposition applicationsANELVA CORP·Filed 2000·Granted Oct 8, 2002·87 cites·13 claims
- 0796US5855685APlasma enhanced CVD apparatus, plasma enhanced processing apparatus and plasma enhanced CVD methodANELVA CORP·Filed 1996·Granted Jan 5, 1999·220 cites·27 claims
- 0896US4825808ASubstrate processing apparatusANELVA CORP·Filed 1987·Granted May 2, 1989·250 cites·6 claims
- 0996US4816638AVacuum processing apparatusANELVA CORP·Filed 1987·Granted Mar 28, 1989·335 cites·6 claims
- 1095US5676758ACVD apparatusANELVA CORP·Filed 1996·Granted Oct 14, 1997·209 cites·12 claims
- 1195US4960073AMicrowave plasma treatment apparatusANELVA CORP·Filed 1989·Granted Oct 2, 1990·117 cites·7 claims
- 1294US6361667B1Ionization sputtering apparatusANELVA CORP·Filed 1998·Granted Mar 26, 2002·107 cites·10 claims
- 1394US6077403ASputtering device and sputtering methodANELVA CORP·Filed 1998·Granted Jun 20, 2000·159 cites·22 claims
- 1494US4643629AAutomatic loaderANELVA CORP·Filed 1985·Granted Feb 17, 1987·164 cites·6 claims
- 1593US6382895B1Substrate processing apparatusANELVA CORP·Filed 1999·Granted May 7, 2002·147 cites·19 claims
- 1693US6143077AChemical vapor deposition apparatusANELVA CORP·Filed 1997·Granted Nov 7, 2000·125 cites·7 claims
- 1793US5906262APositioning control system for a non-contacting magnetic conveyor systemANELVA CORP·Filed 1998·Granted May 25, 1999·63 cites·3 claims
- 1893US4950956APlasma processing apparatusANELVA CORP·Filed 1987·Granted Aug 21, 1990·71 cites·11 claims
- 1993US4638209AIon beam generating apparatusANELVA CORP·Filed 1984·Granted Jan 20, 1987·56 cites·21 claims
- 2092US7159537B2Device for fixing a gas showerhead or target plate to an electrode in plasma processing systemsANELVA CORP·Filed 2004·Granted Jan 9, 2007·54 cites·27 claims
- 2192US6827788B2Substrate processing device and through-chamberANELVA CORP·Filed 2001·Granted Dec 7, 2004·62 cites·15 claims
- 2292US6427623B2Chemical vapor deposition systemANELVA CORP·Filed 2001·Granted Aug 6, 2002·225 cites·6 claims
- 2392US6189485B1Plasma CVD apparatus suitable for manufacturing solar cell and the likeANELVA CORP·Filed 1999·Granted Feb 20, 2001·81 cites·11 claims
- 2492US5505779AIntegrated module multi-chamber CVD processing system and its method for processing substratesANELVA CORP·Filed 1994·Granted Apr 9, 1996·73 cites·11 claims
- 2591US6251232B1Method of removing accumulated films from the surface of substrate holders in film deposition apparatus, and film deposition apparatusANELVA CORP·Filed 2000·Granted Jun 26, 2001·64 cites·27 claims
- 2691US4761219AMagnetron sputtering etching apparatusANELVA CORP·Filed 1987·Granted Aug 2, 1988·49 cites·3 claims
- 2791US4691160AApparatus comprising a double-collector electron multiplier for counting the number of charged particlesANELVA CORP·Filed 1984·Granted Sep 1, 1987·56 cites·7 claims
- 2890US6455101B1Method for depositing a protective carbon coating on a data recording diskANELVA CORP·Filed 2000·Granted Sep 24, 2002·27 cites·9 claims
- 2990US6228439B1Thin film deposition apparatusANELVA CORP·Filed 2000·Granted May 8, 2001·43 cites·5 claims
- 3090US6080446AMethod of depositing titanium nitride thin film and CVD deposition apparatusANELVA CORP·Filed 1998·Granted Jun 27, 2000·106 cites·5 claims
- 3190US5968327AIonizing sputter device using a coil shieldANELVA CORP·Filed 1998·Granted Oct 19, 1999·66 cites·16 claims
- 3290US5925227AMultichamber sputtering apparatusANELVA CORP·Filed 1997·Granted Jul 20, 1999·90 cites·10 claims
- 3390US5569350AMechanism and method for mechanically removing a substrateANELVA CORP·Filed 1995·Granted Oct 29, 1996·120 cites·20 claims
- 3490US5033407ALow pressure vapor phase growth apparatusANELVA CORP·Filed 1990·Granted Jul 23, 1991·94 cites·6 claims
- 3589US4352725ADry etching device comprising an electrode for controlling etch rateANELVA CORP·Filed 1980·Granted Oct 5, 1982·33 cites·6 claims
- 3688US6641703B2Magnetic multi-layer film manufacturing apparatusANELVA CORP·Filed 2001·Granted Nov 4, 2003·38 cites·38 claims
- 3788US5846328AIn-line film deposition systemANELVA CORP·Filed 1996·Granted Dec 8, 1998·137 cites·14 claims
- 3888US5721021AMethod of depositing titanium-containing conductive thin filmANELVA CORP·Filed 1996·Granted Feb 24, 1998·62 cites·14 claims
- 3987US7060194B2Dry etching method for magnetic materialANELVA CORP·Filed 2004·Granted Jun 13, 2006·42 cites·19 claims
- 4087US6872289B2Thin film fabrication method and thin film fabrication apparatusANELVA CORP·Filed 2001·Granted Mar 29, 2005·42 cites·14 claims
- 4187US6800183B2Sputtering deviceANELVA CORP·Filed 2002·Granted Oct 5, 2004·32 cites·35 claims
- 4287US6375756B1Method for removing a deposited filmANELVA CORP·Filed 2000·Granted Apr 23, 2002·38 cites·12 claims
- 4387US6365009B1Combined RF-DC magnetron sputtering methodANELVA CORP·Filed 1998·Granted Apr 2, 2002·70 cites·12 claims
- 4487US5534072AIntegrated module multi-chamber CVD processing system and its method for processing subtratesANELVA CORP·Filed 1993·Granted Jul 9, 1996·58 cites·59 claims
- 4587US5458759AMagnetron sputtering cathode apparatusANELVA CORP·Filed 1994·Granted Oct 17, 1995·61 cites·12 claims
- 4687US4968374APlasma etching apparatus with dielectrically isolated electrodesANELVA CORP·Filed 1989·Granted Nov 6, 1990·54 cites·5 claims
- 4786US6878249B2High frequency sputtering deviceANELVA CORP·Filed 2001·Granted Apr 12, 2005·53 cites·17 claims
- 4886US6663714B2CVD apparatusANELVA CORP·Filed 2001·Granted Dec 16, 2003·63 cites·44 claims
- 4986US6571729B2Apparatus for depositing a thin film on a data recording diskANELVA CORP·Filed 2001·Granted Jun 3, 2003·29 cites·6 claims
- 5086US6572934B2Method for manufacturing a magnetic recording diskANELVA CORP·Filed 2001·Granted Jun 3, 2003·20 cites·26 claims
Showing the top 50 of 263 patent records by PatentIndex Score.
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